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This content will become publicly available on July 16, 2026

Title: Material-Specific Diffusion Barrier Performance of Al 2 O 3 for p-Type and n-Type Oxide Semiconductors in Oxide-Based CMOS Applications
Award ID(s):
2207302
PAR ID:
10633263
Author(s) / Creator(s):
; ; ; ; ; ; ; ; ; ; ; ;
Publisher / Repository:
American Chemical Society
Date Published:
Journal Name:
ACS Applied Materials & Interfaces
Volume:
17
Issue:
28
ISSN:
1944-8244
Page Range / eLocation ID:
40810 to 40825
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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