This content will become publicly available on July 16, 2026
                            
                            Material-Specific Diffusion Barrier Performance of Al 2 O 3 for p-Type and n-Type Oxide Semiconductors in Oxide-Based CMOS Applications
                        
                    - Award ID(s):
- 2207302
- PAR ID:
- 10633263
- Publisher / Repository:
- American Chemical Society
- Date Published:
- Journal Name:
- ACS Applied Materials & Interfaces
- Volume:
- 17
- Issue:
- 28
- ISSN:
- 1944-8244
- Page Range / eLocation ID:
- 40810 to 40825
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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