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Power devices are highly desirable to possess excellent avalanche and short-circuit (or surge-current) robustness for numerous power electronics applications like automotive powertrains, electric grids, motor drives, among many others. Current commercial GaN power device, the lateral GaN high-electron-mobility transistor (HEMT), is known to have no avalanche capability and very limited short-circuit robustness. These limitations have become a roadblock for penetration of GaN devices in many industrial power applications. Recently, through collaborations with NexGen Power Systems (NexGen), Inc., we have demonstrated breakthrough avalanche, surge-current and short-circuit robustness in NexGen’s vertical GaN p-n diodes and fin-shape junction-gate field-effect-transistors (Fin-JFETs). These large-area GaN diodes and Fin-JFETs were manufactured in NexGen’s 100 mm GaN-on-GaN fab. The demonstrated avalanche, surge-current and short-circuit capabilities are comparable or even superior to Si and SiC power devices. Additionally, vertical GaN Fin-JFETs were found to fail to open-circuit under avalanche and short-circuit conditions, which is highly desirable for the system safety. This talk reviews the key robustness results of vertical GaN power devices and unveils the enabling device physics. Fundamentally, these results signify that, in contrast to some popular belief, GaN devices with appropriate designs can achieve excellent robustness and thereby encounter no barriers for applications in electric vehicles, grids, renewable processing, and industrial motor drives.
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This content will become publicly available on September 1, 2026
The renaissance of lateral power devices for high voltage applications
Power semiconductor devices, spanning blocking voltages from a few volts to tens of thousands of volts, are critical for efficient energy conversion in numerous applications and serve as key enablers of carbon neutrality. These devices can be realized in either vertical or lateral architectures, with the former preferred for high-power discrete devices and the latter offering high switching speeds and monolithic circuit integration. While lateral structures have long been utilized in low- and medium-voltage applications, recent advancements in multidimensional device architectures and (ultra-)wide-bandgap semiconductor materials have revitalized their potential for high-voltage applications. Multidimensional architectures, such as superjunction and multichannel designs, enable uniform electric field distribution for voltage scaling and, at the same time, boost carrier concentrations to enhance current capacity. The application of these architectures in gallium nitride and gallium oxide has led to the demonstration of multi-kilovolt lateral devices with diverse designs, achieving breakdown voltages exceeding 10 000 V, average electric fields up to 4.7 MV/cm, high-temperature operation up to 250 °C, and specific on-resistances at least 2–3 times lower than similarly rated vertical devices. Such advantages can be further enhanced through the implementation of monolithic bidirectional devices, a unique capability of the lateral architecture that enables the replacement of four vertical devices. This review provides an overview of multidimensional high-voltage lateral devices, emphasizing their fundamental device physics to inspire further applications across various material systems. The theoretical performance limits of multidimensional lateral devices are also analyzed. In addition, we discuss critical knowledge gaps that must be addressed for industrial adoption, highlighting emerging research opportunities in this rapidly evolving field.
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- Award ID(s):
- 2230412
- PAR ID:
- 10642140
- Publisher / Repository:
- APL
- Date Published:
- Journal Name:
- APL Electronic Devices
- Volume:
- 1
- Issue:
- 3
- ISSN:
- 2995-8423
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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