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Abstract Electric-field-assisted atomic force microscope (E-AFM) nanolithography is a novel polymer-patterning technique that has diverse applications. E-AFM uses a biased AFM tip with conductive coatings to make patterns with little probe-sample interaction, which thereby avoids the tip wear that is a major issue for contact-mode AFM-based lithography, which usually requires a high probe-sample contact force to fabricate nanopatterns; however, the relatively large tip radius and large tip-sample separation limit its capacity to fabricate high-resolution nanopatterns. In this paper, we developed a contact mode E-AFM nanolithography approach to achieve high-resolution nanolithography of poly (methyl methacrylate) (PMMA) using a conductive AFM probe with a low stiffness (~0.16 N/m). The nanolithography process generates features by biasing the AFM probe across a thin polymer film on a metal substrate. A small constant force (0.5-1 nN) applied on the AFM tip helps engage the tip-film contact, which enhances nanomachining resolution. This E-AFM nanolithography approach enables high-resolution nanopatterning with feature width down to ~16 nm, which is less than one half of the nominal tip radius of the employed conductive AFM probes.more » « less
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Li, Ning ; Dmuchowski, Christopher M ; Jiang, Yingchun ; Yi, Chenglin ; Gou, Feilin ; Deng, Jia ; Ke, Changhong ; Chew, Huck Beng ( , Scripta Materialia)
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Dmuchowski, Christopher M. ; Yi, Chenglin ; Gou, Feilin ; Sharma, Anju ; Park, Cheol ; Ke, Changhong ( , Extreme Mechanics Letters)null (Ed.)
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Alsmairat, Ohood Q. ; Gou, Feilin ; Dmuchowski, Christopher M. ; Chiarot, Paul R. ; Park, Cheol ; Miles, Ron N. ; Ke, Changhong ( , Journal of Physics D: Applied Physics)