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Magnetic behavior in metal-free radical thin films

https://doi.org/10.1016/j.chempr.2021.11.021

Junghoefer, Tobias; Calzolari, Arrigo; Baev, Ivan; Glaser, Mathias; Ciccullo, Francesca; Giangrisostomi, Erika; Ovsyannikov, Ruslan; Kielgast, Fridtjof; Nissen, Matz; Schwarz, Julius; et al (March 2022, Chem)

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Radical‐Induced Changes in Transition Metal Interfacial Magnetic Properties: A Blatter Derivative on Polycrystalline Cobalt

https://doi.org/10.1002/anie.202403495

Nowik‐Boltyk, Ewa_Malgorzata; Junghoefer, Tobias; Giangrisostomi, Erika; Ovsyannikov, Ruslan; Shu, Chan; Rajca, Andrzej; Droghetti, Andrea; Casu, M_Benedetta (July 2024, Angewandte Chemie International Edition)

Abstract In this work, we study the interface obtained by depositing a monolayer of a Blatter radical derivative on polycrystalline cobalt. By examining the occupied and unoccupied states at the interface, using soft X‐ray techniques, combined with electronic structure calculations, we could simultaneously determine the electronic structure of both the molecular and ferromagnetic sides of the interface, thus obtaining a full understanding of the interfacial magnetic properties. We found that the molecule is strongly hybridized with the surface. Changes in the core level spectra reflect the modification of the molecule and the cobalt electronic structures inducing a decrease in the magnetic moment of the cobalt atoms bonded to the molecules which, in turn, lose their radical character. Our method allowed us to screen, beforehand, organic/ferromagnetic interfaces given their potential applications in spintronics.
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Challenges in Controlled Thermal Deposition of Organic Diradicals

https://doi.org/10.1021/acs.chemmater.0c03880

Junghoefer, Tobias; Gallagher, Nolan M.; Kolanji, Kubandiran; Giangrisostomi, Erika; Ovsyannikov, Ruslan; Chassé, Thomas; Baumgarten, Martin; Rajca, Andrzej; Calzolari, Arrigo; Casu, Maria Benedetta (March 2021, Chemistry of Materials)
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Thermally and Magnetically Robust Triplet Ground State Diradical

https://doi.org/10.1021/jacs.9b00558

Gallagher, Nolan; Zhang, Hui; Junghoefer, Tobias; Giangrisostomi, Erika; Ovsyannikov, Ruslan; Pink, Maren; Rajca, Suchada; Casu, Maria Benedetta; Rajca, Andrzej (March 2019, Journal of the American Chemical Society)

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Long-Term Degradation Mechanisms in Application-Implemented Radical Thin Films

https://doi.org/10.1021/acsami.3c02057

Nowik-Boltyk, Ewa Malgorzata; Junghoefer, Tobias; Glaser, Mathias; Giangrisostomi, Erika; Ovsyannikov, Ruslan; Zhang, Shuyang; Shu, Chan; Rajca, Andrzej; Calzolari, Arrigo; Casu, M. Benedetta (June 2023, ACS Applied Materials & Interfaces)

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