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Microsphere photolithography (MPL) is a promising technique for cost-effective fabrication of large-scale metasurfaces. This approach generates an array of photonic jets by the collimated illumination of self-assembled microspheres. The photonic jets can be precisely steered within the unit cell defined by each microsphere by changing the angle of incidence. This allows for the creation of complex metasurface element geometries. Computer controlled articulation of the substrate relative to a static UV source allows the direct-write of different metasurface elements. However, this is time-consuming and requires registration between each exposure for complex features. This paper investigates a single exposure method with the dynamic continuous angle of incidence control provided by a Digital Micromirror Device (DMD) in the front Fourier plane of the projection system. The grayscale values of the DMD pixels can be adjusted to provide optical proximity correction. Larger patterns can be achieved by scanning the substrate relative to the exposure beam. This approach is demonstrated with the creation of hierarchical patterns. This work greatly simplifies the MPL exposure process for complex resonators and provides potential for full light field control.

 

Microsphere photolithography (MPL) is an alternative low-cost technique for the large-scale fabrication of periodic structures, such as metasurfaces. This technique utilizes the photonic nanojet generated in the photoresist (PR), by microspheres in near proximity, which are exposed to collimated ultraviolet (UV) flood illumination. In the basic approach, a microsphere array is self-assembled on, or transferred to, the substrate prior to exposure. After exposure, the microspheres are washed away in the development step. The process to recover and clean these microspheres for reuse is complicated. This paper investigates the use of reusable microsphere masks created by fixing the microspheres on a UV transparent support. This is then brought into contact with the photoresist with controlled pressure. There is a trade-off between the quality of the fabricated samples and the wear of the mask determined by the contact pressure. The system is demonstrated using a digital micromirror device (DMD)-based direct-write exposure system to fabricate infrared (IR) metasurfaces. These metasurfaces are characterized and compared to simulation models. Finally, a series of 50 hierarchically patterned IR metasurfaces was fabricated using a single reusable mask. These samples had a <3% coefficient of variance when viewed with a thermal camera. This work shows the potential of mask-based MPL and other contact microlens array-based photolithography techniques for low-cost large-scale fabrication. 

Microsphere photolithography (MPL) has shown promise for the low-cost large-scale manufacturing of infrared (IR) metasurfaces. One challenge of the technique is that the microsphere array needs to be in immediate proximity to the photoresist because of the near-filed effect of the photonic jet. This is typically accomplished by directly transferring the microsphere array onto the photoresist layer. The microspheres are then washed away during the development of the photoresist. While there may be a possibility of recovering, cleaning, and reusing the microspheres, this is not typically done. This work studies the self-assembly of the microspheres on a superstrate which can be reused as a contact mask. The microspheres are fixed to this superstrate to minimize debonding when they are brought into contact with the substrate. IR metasurfaces are fabricated and spectrally characterized. The resonant wavelength of IR metasurfaces is shown to be a good statistical metric for the variation of the patterned surface. The results indicate pressure between the substrate and superstrate is a critical factor in maintaining a minimum gap between the microspheres and photoresist. This work shows a way forward for mask-based microsphere photolithography and provides guidance for future microlens array-based photolithographic techniques.

 

Microsphere Photolithography (MPL) is a nanopatterning technique that utilizes a self-assembled monolayer of microspheres as an optical element to focus incident radiation inside a layer of photoresist. The microspheres produces a sub-diffraction limited photonic-jet on the opposite side of each microsphere from the illumination. When combined with pattern transfer techniques such as etching/lift-off, MPL provides a versatile, low-cost fabrication method for producing hexagonal close-packed metasurfaces. This article investigates the MPL process for creating refractive index (RI) sensors on the cleaved tips of optical fiber. The resonant wavelength of metal elements on the surface is dependent on the local dielectric environment and allows the refractive index of an analyte to be resolved spectrally. A numerical study of hole arrays defined in metal films shows that the waveguide mode provides good sensitivity to the analyte refractive index. This can be readily tuned by adjusting the MPL exposure and the simulation results guide the fabrication of a defect tolerant refractive index sensor on the tip of a fiber tip with a sensitivity of 613 nm/RIU. The conformal nature of the microsphere monolayer simplifies the fabrication process and provides a viable alternative to direct-write techniques such as Focused Ion Beam (FIB) milling 

Atmospheric condensation is very important for multiple practical applications such as heat transfer, thermal management, aerospace, and condensate harvesting. Water droplets heterogeneously nucleate on the surfaces when the temperature is below the dew point temperature. The nucleation energy barrier for a condensed droplet varies significantly with the humidity content in the operating environment. The freezing of this condensate is also dependent on the operating conditions and surface properties. This article presents an experimental study of condensation and freezing from humid air with the objective of understanding how the surface morphology and chemistry determines the droplet shape and wetting state. Hexagonal close-packed arrays of titanium (Ti) pillars are patterned using microsphere photolithography (MPL). The Ti nanostructured surface was tested with and without a Teflon© coating to reveal the condensate harvesting, passive freezing, and dropwise condensation applications, respectively. Condensation and freezing tests were conducted in the presence of non-condensable gases (air) with different relative humidity (RH) levels to control the nucleation site density. The experiments showed that droplet growth occurs in the following stages: initial nucleation, direct growth, and coalescence events. By pinning droplets, coalescence is suppressed for the Ti nanopillared surface altering the size distribution of droplets and significantly accelerating the freezing process.