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Abstract The vast high entropy alloy (HEA) composition space is promising for discovery of new material phases with unique properties. This study explores the potential to achieve rare‐earth‐free high magnetic anisotropy materials in single‐phase HEA thin films. Thin films of FeCoNiMnCu sputtered on thermally oxidized Si/SiO₂substrates at room temperature are magnetically soft, with a coercivity on the order of 10 Oe. After post‐deposition rapid thermal annealing (RTA), the films exhibit a single face‐centered‐cubic phase, with an almost 40‐fold increase in coercivity. Inclusion of 50 at.% Pt in the film leads to ordering of a singleL1₀high entropy intermetallic phase after RTA, along with high magnetic anisotropy and 3 orders of magnitude coercivity increase. These results demonstrate a promising HEA approach to achieve high magnetic anisotropy materials using RTA. 

Abstract We report the results of polarization‐dependent Raman spectroscopy of phonon states in single‐crystalline quasi‐one‐dimensional NbTe₄and TaTe₄van der Waals materials. The measurements were conducted in the wide temperature range from 80 to 560 K. Our results show that although both materials have identical crystal structures and symmetries, there is a drastic difference in the intensity of their Raman spectra. While TaTe₄exhibits well‐defined peaks through the examined wavenumber and temperature ranges, NbTe₄reveals extremely weak Raman signatures. The measured spectral positions of the phonon peaks agree with the phonon band structure calculated using the density‐functional theory. We offer possible reasons for the intensity differences between the two van der Waals materials. Our results provide insights into the phonon properties of NbTe₄and TaTe₄van der Waals materials and indicate the potential of Raman spectroscopy for studying charge‐density‐wave quantum condensate phases. 

Two-dimensional layered transition metal dichalcogenides are potential thermoelectric candidates with application in on-chip integrated nanoscale cooling and power generation. Here, we report a comprehensive experimental and theoretical study on the in-plane thermoelectric transport properties of thin 2H-MoTe2 flakes prepared in field-effect transistor geometry to enable electrostatic gating and modulation of the electronic properties. The thermoelectric power factor is enhanced by up to 45% using electrostatic modulation. The in-plane thermal conductivity of 9.8 ± 3.7 W m−1 K−1 is measured using the heat diffusion imaging method in a 25 nm thick flake. First-principles calculations are used to obtain the electronic band structure, phonon band dispersion, and electron–phonon scattering rates. The experimental electronic properties are in agreement with theoretical results obtained within energy-dependent relaxation time approximation. The thermal conductivity is evaluated using both the relaxation time approximation and the full iterative solution to the phonon Boltzmann transport equation. This study establishes a framework to quantitively compare first-principle-based calculations with experiments in 2D layered materials. 

We report on the synthesis of self-intercalated Nb1+xSe2 thin films by molecular beam epitaxy. Nb1+xSe2 is a metal-rich phase of NbSe2 where additional Nb atoms populate the van der Waals gap. The grown thin films are studied as a function of the Se to Nb beam equivalence pressure ratio (BEPR). X-ray photoelectron spectroscopy and x-ray diffraction indicate that BEPRs of 5:1 and greater result in the growth of the Nb1+xSe2 phase and that the amount of intercalation is inversely proportional to the Se to Nb BEPR. Electrical resistivity measurements also show an inverse relationship between BEPR and resistivity in the grown Nb1+xSe2 thin films. A second Nb-Se compound with a stoichiometry of ∼1:1 was synthesized using a Se to Nb BEPR of 2:1; in contrast to the Nb1+xSe2 thin films, this compound did not show evidence of a layered structure. 

Among group VI transition metal dichalcogenides, MoTe 2 is predicted to have the smallest energy offset between semiconducting 2H and semimetallic 1T′ states. This makes it an attractive phase change material for both electronic and optoelectronic applications. Here, we report fast, nondestructive, and full phase change in Al 2 O 3 -encapsulated 2H-MoTe 2 thin films to 1T′-MoTe 2 using rapid thermal annealing at 900 °C. Phase change was confirmed using Raman spectroscopy after a short annealing duration of 10 s in both vacuum and nitrogen ambient. No thickness dependence of the transition temperatures was observed for flake thickness ranging from 1.5 to 8 nm. These results represent a major step forward in understanding the structural phase transition properties of MoTe 2 thin films using external heating and underline the importance of surface encapsulation for avoiding thin film degradation.