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A Reset MOSFET is added to a perovskite MOSFET-based photodetector to serve as a current source to mitigate the influence of ionic movement on the performance of the photodetector. With the added MOSFET, the hysteresis is significantly reduced, and the dark current is controllable. The on/off ratio resumes to 10^6 and an ultrasensitive responsivity (over 80,000 A/W) is achieved under only 13 nW/cm^2 red (665 nm) light intensity.more » « less
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Abstract Solution‐processed organic–inorganic metal halide perovskites have recently attracted tremendous attention in the photodetector community due to their excellent optoelectronic properties and facile fabrication. The main challenge in perovskite photodetectors (PSPDs) is to achieve high responsivity and fast speed simultaneously. In this work, this challenge is overcome by employing a directly patterned nanograting methylammonium lead iodide (MAPbI3) film in metal‐semiconductor‐metal (MSM) PSPD on interdigitated indium tin oxide (ITO) electrodes. Because of the improved perovskite morphology after directly patterning by nanoimprint lithography, as well as the enhanced electric field intensity by the perovskite nanograting and interdigitated electrodes, the PSPDs have responsivity of 441 A W−1, detectivity of 8.32 × 1012Jones, response time of 10.7 µs, all of which are among the best performances in MSM PSPDs. Moreover, the PSPDs maintain excellent photocurrent performance after 20 days of air exposure. The approach opens a path to manufacturing‐friendly, high‐performance, and reliable PSPDs and paves the way toward perovskite‐based optoelectronic circuits.
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A novel photodetecting device architecture that combines the optoelectronic property advantages of a perovskite and the amplification properties of a Si metal–oxide–semiconductor field‐effect transistor (MOSFET) to innovate a photodetecting system with ultrahigh sensitivity, especially in low‐light intensity, is demonstrated. This perovskite‐based MOSFET photodetector (PM‐PD) can respond as low as 116 nW cm−2with extremely high responsivity 4200 A W−1. The perovskite is part of the gate dielectric to modulate the MOSFET drain current when the light intensity is changed. A direct bandgap, organic–inorganic hybrid halide perovskite with a large optical absorption coefficient, can enhance photodetector performance. However, perovskite materials are not good conductors for transporting photogenerated electrons and holes compared with single‐crystal silicon. Therefore, the perovskite was utilized as a dielectric where the capacitance is used instead. In the proposed PM‐PD architecture, changing the width‐to‐length (W/L) ratio of perovskite capacitor electrodes, can modulate the dark current from picoamperes to microamperes providing a tunable parameter for optimizing photodetecting performance. Furthermore, the capacitance of the perovskite can be modulated by frequency, which facilitates matching the capacitance of perovskite and MOSFET gate oxide—another important requirement for optimal photodetecting performance. Finally, our novel PM‐PD is commensurate with potential 3D monolithic integration.