Note: When clicking on a Digital Object Identifier (DOI) number, you will be taken to an external site maintained by the publisher.
Some full text articles may not yet be available without a charge during the embargo (administrative interval).
What is a DOI Number?
Some links on this page may take you to non-federal websites. Their policies may differ from this site.
-
more » « less
Semiconductors such as InAs with high dopant concentrations have a variety of applications, including as components of mid-infrared optoelectronic devices. Unfortunately, growth of these materials by molecular beam epitaxy is challenging, requiring high growth rates and low growth temperatures. We show that the use of a bismuth surfactant improves silicon incorporation into InAs while simultaneously reducing the optical scattering rate, increasing the carrier mobility, reducing surface roughness, and enabling growth at higher substrate temperatures and slower growth rates. We explain our findings using microscopic theories of dopant segregation and defect formation in III-V materials.
