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Award ID contains: 1710957

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  1. Amorphous tantala ( T a 2 O 5 ) thin films were deposited by reactive ion beam sputtering with simultaneous low energy assist A r + or A r + / O 2 + bombardment. Under the conditions of the experiment, the as-deposited thin films are amorphous and stoichiometric. The refractive index and optical band gap of thin films remain unchanged by ion bombardment. Around 20% improvement in room temperature mechanical loss and 60% decrease in absorption loss are found in samples bombarded with 100-eV A r + . A detrimental influence from low energy O 2 + bombardment on absorption loss and mechanical loss is observed. Low energy A r + bombardment removes excess oxygen point defects, while O 2 + bombardment introduces defects into the tantala films. 
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