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Title: Modifications of ion beam sputtered tantala thin films by secondary argon and oxygen bombardment
Amorphous tantala ( T a 2 O 5 ) thin films were deposited by reactive ion beam sputtering with simultaneous low energy assist A r + or A r + / O 2 + bombardment. Under the conditions of the experiment, the as-deposited thin films are amorphous and stoichiometric. The refractive index and optical band gap of thin films remain unchanged by ion bombardment. Around 20% improvement in room temperature mechanical loss and 60% decrease in absorption loss are found in samples bombarded with 100-eV A r + . A detrimental influence from low energy O 2 + bombardment on absorption loss and mechanical loss is observed. Low energy A r + bombardment removes excess oxygen point defects, while O 2 + bombardment introduces defects into the tantala films.  more » « less
Award ID(s):
1710957 1708175 1707866
PAR ID:
10130458
Author(s) / Creator(s):
; ; ; ; ; ; ; ;
Publisher / Repository:
Optical Society of America
Date Published:
Journal Name:
Applied Optics
Volume:
59
Issue:
5
ISSN:
1559-128X; APOPAI
Format(s):
Medium: X Size: Article No. A150
Size(s):
Article No. A150
Sponsoring Org:
National Science Foundation
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