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Abstract Through years of development, we have successfully demonstrated 3D light field lithography with UV continuous light. We recently combined this approach with femtosecond laser sources as two-photon femtosecond 3D light lithography. It is found that consistent results can happen under limited conditions with this direct combination. Our theoretical analysis reported last year shows that the experimental difficulty can be attributed to digital micro-mirror devices (DMD) and microlens arrays (MLA) used in the current 3D light field projection. Though they can control the propagation directions and interact at designed 3D locations, rays from such a system diverge with respect to the propagation distance. As a result, 3D voxel intensity in the 3D projection changes as a function of the separation distance with respect to the MLA in the 3D projection. To solve this problem, we replace the combination of DMD and MLA with a phase-controlled spatial light modulator. With a lab-developed algorithm, a single femtosecond laser pulse can generate up to a million sub-rays through the phase-controlled spatial light modulator. These sub-rays with a precisely controlled propagation direction can intersect at designed 3D locations as voxels for 3D virtual object constructions. Moreover, these sub-rays have minimum divergence angles to ensure that the voxel intensities are maintained consistently at each 3D location. We also demonstrated that versatile 3D patterns could be generated with two-photon femtosecond 3D light field lithography based on this innovative approach. 

Based on the microscale 3D point cloud projection with a digital micromirror device (DMD) and a microlens array (MLA) developed recently, we explore the capabilities of this specific type of 3D projection in 3D lithography with femtosecond light in this study. Unlike 3D point cloud projection with UV continuous light demonstrated before, high accuracy positioning between the DMD and the MLA is required to have rays simultaneously arrive at the designed voxel positions to induce two-photon absorption with femtosecond light. Because of this additional requirement, a new positioning method through direct microscope inspection of the relative positions of the DMD and the MLA is developed in this study. Because of the usage of a rectangular MLA, around four rays can arrive at each projecting voxel at the same time. Thus, to the best of our knowledge, a new algorithm for determining the pixel map on the DMD to the 3D point cloud projection with a femtosecond laser is also developed. It is observed that a very long exposure time is required to generate 3D patterns with the new 3D projection scheme because of the very limited number of rays used for projecting each voxel with the new algorithm. It is also found that 3D structures with desired shapes should be projected far away from the MLA ( $\sim <\#comment/>15f$to $30f$, with $f$being the focal distance of the MLA) in the 3D lithography with this femtosecond 3D point cloud projection. For patterns projected closer than $10f$, shapes are distorted because of unwanted voxels cured with the 3D projection technique using a DMD and MLA. 

A methodology of 3D photolithography through light field projections with a microlens array (MLA) is proposed and demonstrated. With the MLA, light from a spatial light modulator (SLM) can be delivered to arbitrary positions, i.e., voxels, in a 3D space with a focusing scheme we developed. A mapping function between the voxel locations and the SLM pixel locations can be one-to-one determined by ray tracing. Based on a correct mapping function, computer-designed 3D virtual objects can be reconstructed in a 3D space through a SLM and a MLA. The projected 3D virtual object can then be optically compressed and delivered to a photoresist layer for 3D photolithography. With appropriate near-UV light, 3D microstructures can be constructed at different depths inside the photoresist layer. This 3D photolithography method can be useful in high-speed 3D patterning at arbitrary positions. We expect high-precision 3D patterning can also be achieved when a femtosecond light source and the associated multi-photon curing process is adopted in the proposed light field 3D projection/photolithography scheme. Multi-photon polymerization can prevent the unwilling patterning of regions along the optical path before arriving to the designed focal voxels as observed in our single photon demonstrations.