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Abstract Quantum semiconductor structures are commonly achieved by bandgap engineering, which relies on the ability to switch from one semiconductor to another during their growth. Growth of a superlattice is typically demanding technologically. In contrast, accumulated evidence points to a tendency among a certain class of multiple‐cation binary oxides to self‐assemble spontaneously as superlattice structures. This class is dubbed the homologous superlattices. For a famous example, when a mixture of indium and zinc is oxidized, the phases of In‐O and ZnO separate in an orderly periodic manner, along the ZnO polar axis, with polarity inversion taking place between consecutive ZnO sections. The same structure is observed when the indium is replaced with other metals, and perhaps even in ZnO alone. This peculiar self‐assembled structure is attracting research over the past decade. The purpose of this study is to gain understanding of the physics underlying the formation of this unique structure. Here, an explanation is proposed for the long‐standing mystery of this intriguing self‐assembly in the form of an electrostatic growth phenomenon and a test of the proposed model is carried out on experimental data. 

We examine the arsenic distribution and its influence on dopant activation in poly-crystalline CdTe1−xSex solar cell absorbers prepared by vapor transport deposition followed by CdCl2 annealing. For as-deposited CdTe:As, local-electrode atom probe (LEAP) tomography reveals non-uniform distributions of arsenic clusters in the top “doped” layers. Following CdCl2 annealing, secondary ion mass spectrometry suggests that arsenic has diffused into the entire CdTe layer, while LEAP tomography reveals dissolution of the clusters, with nearly uniform distribution of arsenic atoms in CdTe. Since the arsenic fraction (fAs) is 1 × 1018 cm−3, but the hole density ranges from 7.5 to 9.5 × 1015 cm−3, we hypothesize that a large fraction of the arsenic has been incorporated into interstitial sites or cadmium substitutional sites, resulting in limited dopant activation. 

We utilize a combined computational-experimental approach to examine the influence of indium nanoparticle (NP) array distributions on deep-ultraviolet (UV) plasmon resonances. For photon energies < 5.7 eV, analysis of ellipsometric spectra reveals an increase in silicon reflectance induced by indium NP arrays on silicon. For various energies in the range 5.7–7.0 eV, a decrease in reflectance is induced by the NP arrays. Similar trends in reflectance are predicted from finite-difference time-domain (FDTD) simulations using NP size distributions extracted from atomic-force micrographs as input. In addition, in the energy range of 7.4–9.2 eV, the FDTD simulations reveal reflectance minima, characteristic of localized surface plasmon resonances. Electron energy-loss spectroscopy collected from individual indium NPs reveals the presence of LSPR at ≈ 8 eV, further supporting the promise of indium NP arrays on silicon for deep-UV plasmonics. 

Semiconductor quantum dots (QDs) are nanostructures that can enhance the performance of electronic devices due to their 3D quantization. Typically, heterovalent impurities, or dopants, are added to semiconducting QDs to provide extra electrons and improve conductivity. Since each QD is expected to contain a few dopants, the extra electrons and their parent dopants have been difficult to locate. In this work, we investigate the spatial distribution of the extra electrons and their parent donors in epitaxial InAs/GaAs QDs using local-electrode atom-probe tomography and self-consistent Schrödinger–Poisson simulations in the effective mass approximation. Although dopants are provided in both layers, the ionized donors primarily reside outside of the QDs, providing extra electrons that are contained within the QDs. Indeed, due to the quantum confinement-induced enhancement of the donor ionization energy within the QDs, a lower fraction of dopants within the QDs are ionized. These findings suggest a pathway toward the development of 3D modulation-doped nanostructures. 

AlScN is a new wide bandgap, high-k, ferroelectric material for radio frequency (RF), memory, and power applications. Successful integration of high-quality AlScN with GaN in epitaxial layer stacks depends strongly on the ability to control lattice parameters and surface or interface through growth. This study investigates the molecular beam epitaxy growth and transport properties of AlScN/GaN multilayer heterostructures. Single-layer Al1−xScxN/GaN heterostructures exhibited lattice-matched composition within x = 0.09–0.11 using substrate (thermocouple) growth temperatures between 330 and 630 °C. By targeting the lattice-matched Sc composition, pseudomorphic AlScN/GaN multilayer structures with ten and twenty periods were achieved, exhibiting excellent structural and interface properties as confirmed by x-ray diffraction (XRD) and scanning transmission electron microscopy (STEM). These multilayer heterostructures exhibited substantial polarization-induced net mobile charge densities of up to 8.24 × 1014/cm2 for twenty channels. The sheet density scales with the number of AlScN/GaN periods. By identifying lattice-matched growth condition and using it to generate multiple conductive channels, this work enhances our understanding of the AlScN/GaN material platform. 

We have investigated the origins of photoluminescence from quantum dot (QD) layers prepared by alternating depositions of sub-monolayers and a few monolayers of size-mismatched species, termed as sub-monolayer (SML) epitaxy, in comparison with their Stranski–Krastanov (SK) QD counterparts. Using measured nanostructure sizes and local In-compositions from local-electrode atom probe tomography as input into self-consistent Schrödinger–Poisson simulations, we compute the 3D confinement energies, probability densities, and photoluminescence (PL) spectra for both InAs/GaAs SML- and SK-QD layers. A comparison of the computed and measured PL spectra suggests one-dimensional electron confinement, with significant 3D hole localization in the SML-QD layers that contribute to their enhanced PL efficiency in comparison to their SK-QD counterparts. 

We have examined the origins of polytype selection during metal-mediated molecular-beam epitaxy of GaN nanowires (NWs). High-angle annular dark-field scanning transmission electron microscopy reveals [111]-oriented zinc blende (ZB) NWs and [0001]-oriented wurtzite (WZ) NWs, with SixNy at the interface between individual NWs and the Si (001) substrate. Quantitative energy dispersive x-ray spectroscopy reveals a notably higher Si concentration of 7.0% ± 2.3% in zinc blende (ZB) NWs than 2.3% ± 1.2% in wurtzite (WZ) NWs. Meanwhile, density functional theory calculations show that incorporation of 8 at. % Si on the Ga sublattice inverts the difference in formation energies between WZ and ZB GaN, such that the ZB polytype of GaN is stabilized. This identification of Si and other ZB polytype stabilizers will enable the development of polytype heterostructures in a wide variety of WZ-preferring compounds. 

N incorporation mechanisms in GaAs1−xNx alloys are probed using combined experimental and computational Rutherford backscattering spectrometry and nuclear reaction analysis angular yield scans. For xN < 0.025, in addition to substitutional nitrogen, NAs, (N-N)As, and (N-As)As split-interstitials are observed. However, for xN ≥ 0.025, evidence for N tetrahedral interstitials, Ntetra, emerges. We propose a mechanism for stabilization of Ntetra in which the elastic interaction between Ntetra and NAs is induced by the opposite signs of their misfit volumes. This work opens opportunities for exploring the formation of Ntetra and its influence on the properties of a variety of highly mismatched alloys.