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  1. ; ; ; ; ; ; ; ; ; ; et al (, ACS Applied Materials & Interfaces)
    The scalable and facile preparation of single-atom catalysts remains a critical challenge. Here, we introduce Diluted Atomic Layer Deposition (DALD), a unique approach for synthesizing supported metal catalysts with precisely tunable loadings. Unlike conventional metal deposition by ALD which uses pure metal precursors, DALD employs a diluted precursor mixture, combining organometallic precursors with the corresponding free ligand in controlled ratios. The method enables precise control over metal loadings, allowing the synthesis of structures ranging from nanoparticles to isolated single atoms, as exemplified by Ir, Rh, and Pt on high-surface-area γ-Al2O3. With its inherent simplicity and exceptional efficiency in metal precursor utilization, DALD represents a highly scalable strategy, unlocking opportunities for integrating single-atom catalysts into industrial processes. 
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    Free, publicly-accessible full text available August 27, 2026
  2. ; ; ; (, Catalysts)
    This study explores the application of Atomic Layer Deposition (ALD) to functionalize high-surface-area carbon supports with metal and metal oxide films and particles for applications in catalysis and electrocatalysis. The work reported here demonstrates that, through careful choice of precursors and absorption and reaction conditions, self-limited ALD growth on a high-surface-area carbon support can be achieved. Specific examples presented include the growth of conformal films of ZrO2 and SnO2 and the deposition of Ga2O3 and Pt particles on a carbon black support with a surface area of 250 m2·g−1. A novel strategy for controlling the Pt weight loading and producing sub-nanometer Pt particles on a carbon support using a single ALD cycle is also presented. 
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    Free, publicly-accessible full text available November 1, 2025