Kuebler, Stephen M., Xia, Chun, Yang, Geng, Sharma, Rashi, Martinez, Noel P., Rumpf, Raymond C., Touma, Jimmy, Panning, Eric M., and Sanchez, Martha I. 3D printing functional nano-photonic devices by multi-photon lithography. Retrieved from https://par.nsf.gov/biblio/10095586. 1. S. M. Kuebler, C. Xia, G. Yang, R. Sharma, N. P. Martinez, R. C. Rumpf and J. Touma. "3D printing functional nano-photonic devices by mulSPIE Advanced Lithography: Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 10958. Web. doi:10.1117/12.2518030.

Kuebler, Stephen M., Xia, Chun, Yang, Geng, Sharma, Rashi, Martinez, Noel P., Rumpf, Raymond C., Touma, Jimmy, Panning, Eric M., & Sanchez, Martha I. 3D printing functional nano-photonic devices by multi-photon lithography. 1. S. M. Kuebler, C. Xia, G. Yang, R. Sharma, N. P. Martinez, R. C. Rumpf and J. Touma. "3D printing functional nano-photonic devices by mulSPIE Advanced Lithography: Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS, 10958 (). Retrieved from https://par.nsf.gov/biblio/10095586. https://doi.org/10.1117/12.2518030

Kuebler, Stephen M., Xia, Chun, Yang, Geng, Sharma, Rashi, Martinez, Noel P., Rumpf, Raymond C., Touma, Jimmy, Panning, Eric M., and Sanchez, Martha I. "3D printing functional nano-photonic devices by multi-photon lithography". 1. S. M. Kuebler, C. Xia, G. Yang, R. Sharma, N. P. Martinez, R. C. Rumpf and J. Touma. "3D printing functional nano-photonic devices by mulSPIE Advanced Lithography: Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 10958 (). Country unknown/Code not available. https://doi.org/10.1117/12.2518030. https://par.nsf.gov/biblio/10095586.

@article{osti_10095586,
place = {Country unknown/Code not available}, title = {3D printing functional nano-photonic devices by multi-photon lithography}, url = {https://par.nsf.gov/biblio/10095586}, DOI = {10.1117/12.2518030}, abstractNote = {}, journal = {1. S. M. Kuebler, C. Xia, G. Yang, R. Sharma, N. P. Martinez, R. C. Rumpf and J. Touma. "3D printing functional nano-photonic devices by mulSPIE Advanced Lithography: Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS}, volume = {10958}, author = {Kuebler, Stephen M. and Xia, Chun and Yang, Geng and Sharma, Rashi and Martinez, Noel P. and Rumpf, Raymond C. and Touma, Jimmy and Panning, Eric M. and Sanchez, Martha I.}, }