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The bandgap of wurzite ZnO layers grown on 2 inch diameter c-Al2O3 substrates by pulsed laser deposition was engineered from 3.7 to 4.8 eV by alloying with Mg. Above this Mg content the layers transformed from single phase hcp to mixed hcp/fcc phase before becoming single phase fcc above a bandgap of about 5.5 eV. Metal-Semiconductor-Metal (MSM) photodetectors based on gold Inter-Digitated-Transducer structures were fabricated from the single phase hcp layers by single step negative photolithography and then packaged in TO5 cans. The devices gave over 6 orders of magnitude of separation between dark and light signal with solar rejection ratios (I270 : I350) of over 3 x 105 and dark signals of 300 pA (at a bias of -5V). Spectral responsivities were engineered to fit the “Deutscher Verein des Gas- und Wasserfaches” industry standard form and gave over two decade higher responsivities (14 A/W, peaked at 270 nm) than commercial SiC based devices. Homogeneous Ga2O3 layers were also grown on 2 inch diameter c-Al2O3 substrates by PLD. Optical transmission spectra were coherent with a bandgap that increased from 4.9 to 5.4 eV when film thickness was decreased from 825 to 145 nm. X-ray diffraction revealed that the films were of the β-Ga2O3 (monoclinic) polytype with strong (-201) orientation. β-Ga2O3 MSM photodetectors gave over 4 orders of magnitude of separation between dark and light signal (at -5V bias) with dark currents of 250 pA and spectral responsivities of up to 40 A/W (at -0.75V bias). It was found that the spectral responsivity peak position could be decreased from 250 to 230 nm by reducing film thickness from 825 to 145 nm. This shift in peak responsivity wavelength with film thickness (a) was coherent with the apparent bandgap shift that was observed in transmission spectroscopy for the same layers and (b) conveniently provides a coverage of the spectral region in which MgZnO layers show fcc/hcp phase mixing.
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Understanding quantum confinement and ligand removal in solution-based ZnO thin films from highly stable nanocrystal ink
We report a synthesis procedure for dodecanethiol capped wurtzite ZnO nanocrystals with an average diameter of 4 nm that are monodisperse, highly soluble, and shelf-stable for many months. Compared to previous ZnO ink recipes, we demonstrate improved particle solubility and excellent ink stability, resulting in ZnO nanocrystal inks that are optimized for printed electronics applications. The ZnO nanocrystal solution exhibits an absorption peak at 341 nm (3.63 eV), which represents a blue-shift of approximately 0.3 eV from the bulk ZnO bandgap (∼3.3 eV). This blue shift is consistent with previously reported models for an increased bandgap due to quantum confinement. We used variable-angle spectroscopic ellipsometry (VASE) to determine the optical properties of solution-processed thin films of ZnO nanocrystals, which provides valuable insight into the changes in film composition and morphology that occur during thermal annealing treatments ranging from 150–300 °C. The ZnO nanocrystals maintain their quantum confinement when deposited into a thin film, and the degree of quantum confinement is gradually reduced as the thermal annealing temperature increases. Using infrared absorption measurements (FTIR) and X-ray photoelectron spectroscopy (XPS), we show that the dodecanethiol ligands are removed from the ZnO films during annealing, resulting in a high-purity semiconductor film with very low carbon contamination. Furthermore, we show that annealing at 300 °C results in complete ligand removal with only a slight increase in grain size. Thin-film transistors (TFT) using ZnO nanocrystals as the channel material annealed at 300 °C show moderate mobility (∼0.002 cm 2 V −1 s −1 ) and good on/off ratio >10 4 . These results demonstrate the distinct advantages of colloidal nanocrystals for printed electronics applications: the composition and morphology of the solution-processed film can be carefully tuned by controlling the size and surface coating of the nanocrystals in the ink.
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- Award ID(s):
- 1710008
- PAR ID:
- 10099839
- Date Published:
- Journal Name:
- Journal of Materials Chemistry C
- Volume:
- 6
- Issue:
- 34
- ISSN:
- 2050-7526
- Page Range / eLocation ID:
- 9181 to 9190
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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- Free Publicly Accessible Full Text
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Accepted Manuscript1.0
- Journal Article:
- https://doi.org/10.1039/C8TC01536H
