In an effort to produce the materials of next‐generation photoelectronic devices, postsynthesis halide exchange reactions of perovskite quantum dots are explored to achieve enhanced bandgap tunability. However, comprehensive understanding of the multifaceted halide exchange reactions is inhibited by their vast relevant parameter space and complex reaction network. In this work, a facile room‐temperature strategy is presented for rapid halide exchange of inorganic perovskite quantum dots. A comprehensive understanding of the halide exchange reactions is provided by isolating reaction kinetics from precursor mixing rates utilizing a modular microfluidic platform, Quantum Dot Exchanger (QDExer). The effects of ligand composition and halide salt source on the rate and extent of the halide exchange reactions are illustrated. This fluidic platform offers a unique time‐ and material‐efficient approach for studies of solution phase‐processed colloidal nanocrystals beyond those studied here and may accelerate the discovery and optimization of next‐generation materials for energy technologies.
- Award ID(s):
- 1902702
- NSF-PAR ID:
- 10165733
- Date Published:
- Journal Name:
- Reaction Chemistry & Engineering
- ISSN:
- 2058-9883
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
More Like this
-
more » « less
Abstract -
Whether reagents and samples need to be combined to achieve a desired reaction, or precise concentrations of solutions need to be mixed and delivered downstream, thorough mixing remains a critical step in many microfluidics-based biological and chemical assays and analyses. To achieve complete mixing of fluids in microfluidic devices, researchers have utilized novel channel designs or active intervention to facilitate mass transport and exchange of fluids. However, many of these solutions have a major limitation: their design inherently limits their operational throughput; that is, different designs work at specific flow rates, whether that be low or high ranges, but have difficulties outside of their tailored design regimes. In this work, we present an acoustofluidic mixer that is capable of achieving efficient, thorough mixing across a broad range of flow rates (20–2000 μL min −1 ) using a single device. Our mixer combines active acoustofluidic mixing, which is responsible for mixing fluids at lower flow rates, with passive hydrodynamic mixing, which accounts for mixing fluids at higher flow rates. The mechanism, functionality, and performance of our acoustofluidic device are both numerically and experimentally validated. Additionally, the real-world potential of our device is demonstrated by synthesizing polymeric nanoparticles with comparable sizes over a two-order-of-magnitude wide range of flow rates. This device can be valuable in many biochemical, biological, and biomedical applications. For example, using our platform, one may synthesize nanoparticles/nanomaterials at lower flow rates to first identify optimal synthesis conditions without having to waste significant amounts of reagents, and then increase the flow rate to perform high-throughput synthesis using the optimal conditions, all using the same single device and maintaining performance.more » « less
-
more » « less
Abstract Synthesis of nanoparticles and particulate nanomaterials with tailored properties is a central step toward many applications ranging from energy conversion and imaging/display to biosensing and nanomedicine. While existing microfluidics‐based synthesis methods offer precise control over the synthesis process, most of them rely on passive, partial mixing of reagents, which limits their applicability and potentially, adversely alter the properties of synthesized products. Here, an acoustofluidic (i.e., the fusion of acoustic and microfluidics) synthesis platform is reported to synthesize nanoparticles and nanomaterials in a controllable, reproducible manner through acoustic‐streaming‐based active mixing of reagents. The acoustofluidic strategy allows for the dynamic control of the reaction conditions simply by adjusting the strength of the acoustic streaming. With this platform, the synthesis of versatile nanoparticles/nanomaterials is demonstrated including the synthesis of polymeric nanoparticles, chitosan nanoparticles, organic–inorganic hybrid nanomaterials, metal–organic framework biocomposites, and lipid‐DNA complexes. The acoustofluidic synthesis platform, when incorporated with varying flow rates, compositions, or concentrations of reagents, will lend itself unprecedented flexibility in establishing various reaction conditions and thus enable the synthesis of versatile nanoparticles and nanomaterials with prescribed properties.
-
more » « less
Abstract Microreactor-Assisted Nanomaterial Deposition (MAND) process offers unique capabilities in achieving large size and shape control levels while providing a more rapid path for scaling via process intensification for nanomaterial production. This review highlights the application of continuous flow microreactors to synthesize, assemble, transform, and deposit nanostructured materials for Solar Photovoltaics, the capabilities of MAND in the field, and the potential outlook of MAND Microreactor-Assisted Nanomaterial Deposition (MAND) is a promising technology that synthesizes reactive fluxes and nanomaterials to deposit nanostructured materials at the point of use. MAND offers precise control over reaction, organization, and transformation processes to manufacture nanostructured materials with distinct morphologies, structures, and properties. In synthesis, microreactor technology offers large surface-area-to-volume ratios within microchannel structures to accelerate heat and mass transport. This accelerated transport allows for rapid changes in reaction temperatures and concentrations, leading to more uniform heating and mixing in the deposition process. The possibility of synthesizing nanomaterials in the required volumes at the point of application eliminates the need to store and transport potentially hazardous materials. Further, MAND provides new opportunities for tailoring novel nanostructures and nano-shaped features, opening the opportunity to assemble unique nanostructures and nanostructured thin films. MAND processes control the heat transfer, mass transfer, and reaction kinetics using well-defined microstructures of the active unit reactor cell that can be replicated at larger scales to produce higher chemical production volumes. This critical feature opens a promising avenue in developing scalable nanomanufacturing. This paper reviews advances in microreactor-assisted nanomaterial deposition of nanostructured materials for solar photovoltaics. The discussions review the use of microreactors to tailor the reacting flux, transporting to substrate surfaces via controlling process parameters such as flow rates, pH of the precursor solutions, and seed layers on the formation and/or transformation of intermediary reactive molecules, nanoclusters, nanoparticles, and structured assemblies. In the end, the review discusses the use of an industrial scale MAND to apply anti-reflective and anti-soiling coatings on the solar modules in the field and details future outlooks of MAND reactors.
Graphical abstract -
The design and optimization of highly nonlinear and complex processes like plasma etching is challenging and timeconsuming. Significant effort has been devoted to creating plasma profile simulators to facilitate the development of etch recipes. Nevertheless, these simulators are often difficult to use in practice due to the large number of unknown parameters in the plasma discharge and surface kinetics of the etch material, the dependency of the etch rate on the evolving front profile, and the disparate length scales of the system. Here, we expand on the development of a previously published, data informed, Bayesian approach embodied in the platform RODEo (Recipe Optimization for Deposition and Etching). RODEo is used to predict etch rates and etch profiles over a range of powers, pressures, gas flow rates, and gas mixing ratios of an CF4/Ar gas chemistry. Three examples are shown: (1) etch rate predictions of an unknown material “X” using simulated experiments for a CF4/Ar chemistry, (2) etch rate predictions of SiO2 in a Plasma-Therm 790 RIE reactor for a CF4/Ar chemistry, and (3) profile prediction using level set methods.more » « less
- Free Publicly Accessible Full Text
-
Accepted Manuscript1.0
- Journal Article:
- https://doi.org/10.1039/D0RE00129E
