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1. Demonstration of nearly pinhole-free epitaxial aluminum thin films by sputter beam epitaxy

   https://doi.org/10.1038/s41598-020-74981-2  

   Law, Ka Ming; Budhathoki, Sujan; Ranjit, Smriti; Martin, Franziska; Thind, Arashdeep S.; Mishra, Rohan; Hauser, Adam J. (December 2020, Scientific Reports)

   null (Ed.)

   Abstract Superconducting resonators with high quality factors have been fabricated from aluminum films, suggesting potential applications in quantum computing. Improvement of thin film crystal quality and removal of void and pinhole defects will improve quality factor and functional yield. Epitaxial aluminum films with superb crystallinity, high surface smoothness, and interface sharpness were successfully grown on the c-plane of sapphire using sputter beam epitaxy. This study assesses the effects of varying substrate preparation conditions and growth and prebake temperatures on crystallinity and smoothness. X-ray diffraction and reflectivity measurements yield extensive Laue oscillations and Kiessig thickness fringes for films grown at 200 °C under 15 mTorr Ar, indicating excellent crystallinity and surface smoothness; moreover, an additional substrate preparation procedure which involves (1) a modified substrate cleaning procedure and (2) prebake at 700 °C in 20 mTorr O 2 is shown by atomic force microscopy to yield nearly pinhole-free film growth while maintaining epitaxy and high crystal quality. The modified cleaning procedure is environmentally friendly and eliminates the acid etch steps common to conventional sapphire preparation, suggesting potential industrial application both on standard epitaxial and patterned surface sapphire substrates. 

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2. Demonstration of thick phase-pure β-Ga2O3 on a c-plane sapphire substrate using MOCVD

   https://doi.org/10.1117/12.2661097  

   Jewel, Mohi Uddin; Hasan, Samiul; Crittenden, Scott R.; Avrutin, Vitaliy S.; Özgür, Ümit; Morkoç, Hadis; Ahmad, Iftikhar (March 2023, Proc. SPIE 12422, Oxide-based Materials and Devices)

   Teherani, Ferechteh H.; Rogers, David J. (Ed.)

   We demonstrated a metal-organic chemical vapor deposition (MOCVD) of smooth, thick, and monoclinic phase-pure gallium oxide (Ga2O3) on c-plane sapphire using silicon-oxygen bonding (SiOx) as a phase stabilizer. The corundum (α), monoclinic (β), and orthorhombic (ε) phases of Ga2O3 with a bandgap in the 4.4 – 5.1 eV range, are promising materials for power semiconductor devices and deep ultraviolet (UV) solar-blind photodetectors. The MOCVD systems are extensively used for homoepitaxial growth of β-Ga2O3 on (001), (100), (010), and (¯2 01) β-Ga2O3 substrates. These substrates are rare/expensive and have very low thermal conductivity; thus, are not suitable for high-power semiconductor devices. The c-plane sapphire is typically used as a substrate for high-power devices. The β-Ga2O3 grows in the (¯2 01) direction on sapphire. In this direction, the presence of high-density oxygen dangling bonds, frequent stacking faults, twinning, and other phases and planes impede the heteroepitaxy of thick β-Ga2O3. Previously phase stabilizations with SiOx have been reported for tetragonal and monoclinic hafnia. We were able to grow ~580nm thick β-Ga2O3 on sapphire by MOCVD at 750 oC through phase stabilization using silane. The samples grown with silane have a reduction in the surface roughness and resistivity from 10.7 nm to 4.4 nm and from 371.75 Ω.cm to 135.64 Ω.cm, respectively. These samples show a pure-monoclinic phase determined by x-ray diffraction (XRD); have tensile strain determined by Raman strain mapping. These results show that a thick, phase-pure -Ga2O3 can be grown on c-plane sapphire which can be suitable for creating power devices with better thermal management. 

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3. MOCVD growth and band offsets of κ-phase Ga ₂ O ₃ on c-plane sapphire, GaN- and AlN-on-sapphire, and (100) YSZ substrates

   https://doi.org/10.1116/6.0002106  

   Bhuiyan, A F; Feng, Zixuan; Huang, Hsien-Lien; Meng, Lingyu; Hwang, Jinwoo; Zhao, Hongping (December 2022, Journal of Vacuum Science & Technology A)

   Epitaxial growth of κ-phase Ga 2 O 3 thin films is investigated on c-plane sapphire, GaN- and AlN-on-sapphire, and (100) oriented yttria stabilized zirconia (YSZ) substrates via metalorganic chemical vapor deposition. The structural and surface morphological properties are investigated by comprehensive material characterization. Phase pure κ-Ga 2 O 3 films are successfully grown on GaN-, AlN-on-sapphire, and YSZ substrates through a systematical tuning of growth parameters including the precursor molar flow rates, chamber pressure, and growth temperature, whereas the growth on c-sapphire substrates leads to a mixture of β- and κ-polymorphs of Ga 2 O 3 under the investigated growth conditions. The influence of the crystalline structure, surface morphology, and roughness of κ-Ga 2 O 3 films grown on different substrates are investigated as a function of precursor flow rate. High-resolution scanning transmission electron microscopy imaging of κ-Ga 2 O 3 films reveals abrupt interfaces between the epitaxial film and the sapphire, GaN, and YSZ substrates. The growth of single crystal orthorhombic κ-Ga 2 O 3 films is confirmed by analyzing the scanning transmission electron microscopy nanodiffraction pattern. The chemical composition, surface stoichiometry, and bandgap energies of κ-Ga 2 O 3 thin films grown on different substrates are studied by high-resolution x-ray photoelectron spectroscopy (XPS) measurements. The type-II (staggered) band alignments at three interfaces between κ-Ga 2 O 3 and c-sapphire, AlN, and YSZ substrates are determined by XPS, with an exception of κ-Ga 2 O 3 /GaN interface, which shows type-I (straddling) band alignment. 

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4. Direct Metal-Free Growth and Dry Separation of Bilayer Graphene on Sapphire: Implications for Electronic Applications

   https://doi.org/10.1021/acsanm.3c03533  

   Mohan, Sivasakthya; Kireev, Dmitry; Kutagulla, Shanmukh; Ignacio, Nicholas; Gu, Yuqian; Celio, Hugo; Zhan, Xun; Akinwande, Deji; Liechti, Kenneth M (October 2023, ACS Applied Nano Materials)

   The rate at which graphene is used in different fields of science and engineering has only increased over the past decade and shows no indication of saturating. At the same time, the most common source of high-quality graphene is through chemical vapor deposition (CVD) growth on copper foils with subsequent wet transfer steps that bring environmental problems and technical challenges due to the compliance of copper foils. To overcome these issues, thin copper films deposited on silicon wafers have been used, but the high temperatures required for graphene growth can cause dewetting of the copper film and consequent challenges in obtaining uniform growth. In this work, we explore sapphire as a substrate for the direct growth of graphene without any metal catalyst at conventional metal CVD temperatures. First, we found that annealing the substrate prior to growth was a crucial step to improve the quality of graphene that can be grown directly on such substrates. The graphene grown on annealed sapphire was uniformly bilayer and had some of the lowest Raman D/G ratios found in the literature. In addition, dry transfer experiments have been performed that have provided a direct measure of the adhesion energy, strength, and range of interactions at the sapphire/graphene interface. The adhesion energy of graphene to sapphire is lower than that of graphene grown on copper, but the strength of the graphene–sapphire interaction is higher. The quality of the several centimeter scale transfer was evaluated using Raman, SEM, and AFM as well as fracture mechanics concepts. Based on the evaluation of the electrical characteristics of the graphene synthesized in this work, this work has implications for several potential electronic applications. 

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5. Rotationally Aligned Hexagonal Boron Nitride on Sapphire by High-Temperature Molecular Beam Epitaxy

   Ryan Page1, Yongjin Cho2 (July 2019, Physical review and Physical review letters index)

   Hexagonal boron nitride (hBN) has been grown on sapphire substrates by ultrahigh-temperature molecular beam epitaxy (MBE). A wide range of substrate temperatures and boron fluxes have been explored, revealing that high crystalline quality hBN layers are grown at high substrate temperatures, >1600℃ , and low boron fluxes, ∼1 × 10%& Torr beam equivalent pressure. In situ reflection high-energy electron diffraction revealed the growth of hBN layers with 60° rotational symmetry and the [112+ 0] axis of hBN parallel to the [11+ 00] axis of the sapphire substrate. Unlike the rough, polycrystalline films previously reported, atomic force microscopy and transmission electron microscopy characterization of these films demonstrate smooth, layered, few-nanometer hBN films on a nitridated sapphire substrate. This demonstration of high-quality hBN growth by MBE is a step toward its integration into existing epitaxial growth platforms, applications, and technologies. 

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