We report intrinsic photoconductivity studies on one of the least examined layered compounds, ZrS2.Few-atomic layer ZrS2 field-effect transistors were fabricated on the Si/SiO2 substrate and photoconductivity measurements were performed using both two- and four-terminal configurations under the illumination of 532 nm laser source. We measured photocurrent as a function of the incident optical power at several source-drain (bias) voltages. We observe a significantly large photoconductivity when measured in the multiterminal (four-terminal) configuration compared to that in the two-terminal configuration. For an incident optical power of 90 nW, the estimated photosensitivity and the external quantum efficiency (EQE) measured in two-terminal configuration are 0.5 A/W and 120%, respectively, under a bias voltage of 650 mV. Under the same conditions, the four-terminal measurements result in much higher values for both the photoresponsivity (R) and EQE to 6 A/W and 1400%, respectively. This significant improvement in photoresponsivity and EQE in the four-terminal configuration may have been influenced by the reduction of contact resistance at the metal-semiconductor interface, which greatly impacts the carrier mobility of low conducting materials. This suggests that photoconductivity measurements performed through the two-terminal configuration in previous studies on ZrS2 and other 2D materials have severely underestimated the true intrinsic properties of transition metal dichalcogenides and their remarkable potential for optoelectronic applications.
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High broadband photoconductivity of few-layered MoS 2 field-effect transistors measured using multi-terminal methods: effects of contact resistance
Among the layered two dimensional semiconductors, molybdenum disulfide (MoS 2 ) is considered to be an excellent candidate for applications in optoelectronics and integrated circuits due to its layer-dependent tunable bandgap in the visible region, high ON/OFF current ratio in field-effect transistors (FET) and strong light–matter interaction properties. In this study, using multi-terminal measurements, we report high broadband photocurrent response ( R ) and external quantum efficiency (EQE) of few-atomic layered MoS 2 phototransistors fabricated on a SiO 2 dielectric substrate and encapsulated with a thin transparent polymer film of Cytop. The photocurrent response was measured using a white light source as well as a monochromatic light of wavelength λ = 400 nm–900 nm. We measured responsivity using a 2-terminal configuration as high as R = 1 × 10 3 A W −1 under white light illumination with an optical power P opt = 0.02 nW. The R value increased to 3.5 × 10 3 A W −1 when measured using a 4-terminal configuration. Using monochromatic light on the same device, the measured values of R were 10 3 and 6 × 10 3 A W −1 under illumination of λ = 400 nm when measured using 2- and 4-terminal methods, respectively. The highest EQE values obtained using λ = 400 nm were 10 5 % and 10 6 % measured using 2- and 4-terminal configurations, respectively. The wavelength dependent responsivity decreased from 400 nm to the near-IR region at 900 nm. The observed photoresponse, photocurrent–dark current ratio (PDCR), detectivity as a function of applied gate voltage, optical power, contact resistances and wavelength were measured and are discussed in detail. The observed responsivity is also thoroughly studied as a function of contact resistance of the device.
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- Award ID(s):
- 1900692
- PAR ID:
- 10201946
- Date Published:
- Journal Name:
- Nanoscale
- ISSN:
- 2040-3364
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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Atomically thin 2D transition metal dichalcogenides (TMDs), such as MoS2, are promising candidates for nanoscale photonics because of strong light–matter interactions. However, Fermi‐level pinning due to metal‐induced gap states (MIGS) at the metal–monolayer (1L)‐MoS2interface limits the application of optoelectronic devices based on conventional metals due to high contact resistance. On the other hand, a semimetal–TMD–semimetal device can overcome this limitation, where the MIGS are sufficiently suppressed allowing ohmic contacts. Herein, the optoelectronic performance of a bismuth–1L‐MoS2–bismuth device with ohmic electrical contacts and extraordinary optoelectronic properties is demonstrated. To address the wafer‐scale production, full coverage 1L‐MoS2grown by chemical vapor deposition. High photoresponsivity of 300 A W−1at wavelength 400 nm measured at 77 K, which translates into an external quantum efficiency (EQE) ≈1000 or 105%, is measured. The 90% rise time of the devices at 77 K is 0.1 ms, suggesting they can operate at the speed of ≈10 kHz. High‐performance broadband photodetector with spectral coverage ranging from 380 to 1000 nm is demonstrated. The combination of large‐array device fabrication, high sensitivity, and high‐speed response offers great potential for applications in photonics, including integrated optoelectronic circuits.
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Abstract It is a great challenge to obtain broadband response perovskite photodetectors (PPDs) due to the relatively large bandgaps of the most used methylammonium lead halide perovskites. The response range of the reported PPDs is limited in the ultraviolet–visible range. Here, highly sensitive PPDs are successfully fabricated with low bandgap (≈1.25 eV) (FASnI3)0.6(MAPbI3)0.4perovskite as active layers, exhibiting a broadband response from 300 to 1000 nm. The performance of the PPDs can be optimized by adjusting the thicknesses of the perovskite and C60layers. The optimized PPDs with 1000 nm thick perovskite layer and 70 nm thick C60layer exhibit an almost flat external quantum efficiency (EQE) spectrum from 350 to 900 nm with EQE larger than 65% under −0.2 V bias. Meanwhile, the optimized PPDs also exhibit suppressed dark current of 3.9 nA, high responsivity (
R ) of over 0.4 A W−1, high specific detectivity (D* ) of over 1012Jones in the near‐infrared region under −0.2 V. Such highly sensitive broadband response PPDs, which can work well as self‐powered conditions, offer great potential applications in multicolor light detection. -
High-performance hybrid graphene photodetectors were prepared with endohedral fullerenes deposited on graphene using electrophoretic methods for the first time. Endohedral Sc 3 N@C 80 , which acts as an electron acceptor, was used and the ensuing electronic and optoelectronic properties were measured. Another endohedral fullerene, La@C 82 , was also adsorbed on graphene, which acts as an electron donor. Upon optical illumination, for the Sc 3 N@C 80 –graphene hybrid, the photoinduced free holes are injected into graphene, increasing the hole carrier concentration in graphene, while the photoexcited electrons remain in Sc 3 N@C 80 ; this leads to a high photoresponsivity of ∼10 9 A W −1 , detectivity D of ∼10 15 Jones, and external quantum efficiency EQE ∼ 10 9 % for the Sc 3 N@C 80 –graphene hybrid. This is ∼10 times higher compared to other reports of quantum dot-graphene and few layer MoS 2 –graphene heterostructures. Similarly, for the La@C 82 –graphene hybrid, ∼ 10 8 A W −1 , D ∼ 10 14 Jones, and EQE ∼ 10 6 % were achieved, with electrons being injected into graphene. The exceptional performance gains achieved with both types of hybrid structures confirms the potential of endohedrals to dope graphene for high performance optoelectronic devices using a facile and scalable fabrication process.more » « less
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- Free Publicly Accessible Full Text
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Accepted Manuscript1.0
- Journal Article:
- https://doi.org/10.1039/D0NR07311C
