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1. Number-of-layer resolved (Mo, W)-(S 2 , Se 2 ) phonon relaxation: Number-of-layer resolved (Mo, W)-(S 2 , Se 2 ) phonon relaxation

   https://doi.org/10.1002/jrs.5081  

   Liu, Yonghui ; Bo, Maolin ; Guo, Yongling ; Yang, Xuexian ; Zhang, Xi ; Sun, Chang Q. ; Huang, Yongli ( April 2017 , Journal of Raman Spectroscopy)
2. pH-Response of polycation/Ti 3 C 2 T x MXene layer-by-layer assemblies for use as resistive sensors

   https://doi.org/10.1039/C9ME00142E  

   Echols, Ian J. ; An, Hyosung ; Zhao, Xiaofei ; Prehn, Evan M. ; Tan, Zeyi ; Radovic, Miladin ; Green, Micah J. ; Lutkenhaus, Jodie L. ( January 2020 , Molecular Systems Design & Engineering)

   The importance and widespread need for accurate pH monitoring necessitates the fabrication of new pH sensors with high sensitivity that can be used in a variety of environments. However, typical pH sensors have certain limitations ( e.g. , glass electrodes are fragile and require consistent upkeep, colorimetric pH strips are single use and inaccurate). Herein, we examine the pH-response of multilayers consisting of Ti 3 C 2 T x nanosheets and polycations fabricated using layer-by-layer (LbL) assembly. The MXene sheets themselves are pH-responsive due to their hydroxyl surface groups, and this effect may be amplified with the choice of an appropriate polycation. Specifically, the performance of multilayers assembled with the strong electrolyte poly (diallyldimethylammonium) (PDADMA) or pH-sensitive branched polyethylenimine (BPEI) is compared. As expected, the use of a pH-sensitive constituent leads to a 464% increase in pH sensitivity (116 kΩ pH −1 unit vs. 25 kΩ pH −1 unit) as compared to PDADMA. This is due to the conformational changes that BPEI undergoes with (de)protonation as pH changes. Further comparisons with reduced graphene oxide (rGO), which is far less pH responsive, confirm the unique pH responsivity of MXene nanosheets themselves. The ability to enhance response to particular stimuli by changing the constituent polycation demonstrates promise for future use of MXenes in resistive sensors for a variety of stimuli. 

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3. Competition between Al 2 O 3 atomic layer etching and AlF 3 atomic layer deposition using sequential exposures of trimethylaluminum and hydrogen fluoride

   https://doi.org/10.1063/1.4973310  

   DuMont, Jaime W. ; George, Steven M. ( February 2017 , The Journal of Chemical Physics)
4. Effect of Al 2 O 3 Seed-Layer on the Dielectric and Electrical Properties of Ultrathin MgO Films Fabricated Using In Situ Atomic Layer Deposition

   https://doi.org/10.1021/acsami.9b05601  

   Acharya, Jagaran ; Goul, Ryan ; Romine, Devon ; Sakidja, Ridwan ; Wu, Judy ( August 2019 , ACS Applied Materials & Interfaces)
5. Integrated Isothermal Atomic Layer Deposition/Atomic Layer Etching Supercycles for Area-Selective Deposition of TiO 2

   https://doi.org/10.1021/acs.chemmater.9b01143  

   Song, Seung Keun ; Saare, Holger ; Parsons, Gregory N. ( June 2019 , Chemistry of Materials)