Nanostructured steels are expected to have enhanced irradiation tolerance and improved strength. However, they suffer from poor microstructural stability at elevated temperatures. In this study, Fe–21Cr–5Al–0.026C (wt%) Kanthal D (KD) alloy belonging to a class of (FeCrAl) alloys considered for accident‐tolerant fuel cladding in light‐water reactors is nanostructured using two severe plastic deformation techniques of equal‐channel angular pressing (ECAP) and high‐pressure torsion (HPT), and their thermal stability between 500–700 °C is studied and compared. ECAP KD is found to be thermally stable up to 500 °C, whereas HPT KD is unstable at 500 °C. Microstructural characterization reveals that ECAP KD undergoes recovery at 550 °C and recrystallization above 600 °C, while HPT KD shows continuous grain growth after annealing above 500 °C. Enhanced thermal stability of ECAP KD is from significant fraction (>50%) of low‐angle grain boundaries (GBs) (misorientation angle 2–15°) stabilizing the microstructure due to their low mobility. Small grain sizes, a high fraction (>80%) of high‐angle GBs (misorientation angle >15°) and accordingly a large amount of stored GB energy, serve as the driving force for HPT KD to undergo grain growth instead of recrystallization driven by excess stored strain energy.
A nanostructured oxide‐dispersion‐strengthened (ODS) CoCrFeMnNi high‐entropy alloy (HEA) is synthesized by a powder metallurgy process. The thermal stability, including the grain size and crystal structure of the HEA matrix and oxide dispersions, is carefully investigated by X‐ray diffraction (XRD) and electron microscopy characterizations after annealing at 900 °C. The limited grain growth may be attributed to Zener pinning of yttria dispersions that impede the grain boundary mobility and diffusivity. The high hardness is caused by both the fine grain size and yttria dispersions, which are also retained after annealing at 900 °C. Herein, it is implied that the combination of ODS and HEA concepts may provide a new design strategy for the development of thermally stable nanostructured alloys for extreme environments.
- Award ID(s):
- 1762190
- NSF-PAR ID:
- 10274454
- Publisher / Repository:
- Wiley Blackwell (John Wiley & Sons)
- Date Published:
- Journal Name:
- Advanced Engineering Materials
- Volume:
- 23
- Issue:
- 9
- ISSN:
- 1438-1656
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
More Like this
-
-
The authors report on the evaluation of the oxide scale and the interface microstructure of a Cr–Nb–Ta–V–W refractory high entropy alloy (HEA) at elevated temperatures. The Cr–Nb–Ta–V–W HEA is oxidized at 700 and 800 °C in lab air and the substrate/oxide interface is investigated. Combined in situ X‐ray diffraction (XRD) coupled with ex situ scanning electron microscopy (SEM) and energy dispersive X‐ray spectrometry (EDS) analyses characterize the oxide scale and confirm the phases present in the substrate which have been previously identified in this alloy. The microstructure near the interface is studied for an indication of selective oxidation of this alloy. Cracking and porosity are found along the interface layer which grows directionally outward. Two main oxides are identified: a W‐based oxide with a needle‐like structure and a Cr oxide containing Ta that has a granular structure, primarily found in clusters. The oxide layers are porous, and no dense protective oxide is identified. It is found that when the temperature is increased to 800 °C, the oxide layer exhibits an increase in thickness. In situ XRD indicates that V is the first element to oxidize.
-
In a recent work, we have reported outstanding strength and work hardening exhibited by a metastable high entropy alloy (HEA), Fe42Mn28Co10Cr15Si5 (in at. %), undergoing the strain-induced martensitic transformation from metastable gamma austenite (γ) to stable epsilon martensite (ε). However, the alloy exhibited poor ductility, which was attributed to the presence of the brittle sigma (σ) phase in its microstructure. The present work reports the evolution of microstructure, strength, and ductility of a similar HEA, Fe38.5Mn20Co20Cr15Si5Cu1.5 (in at. %), designed to suppress the formation of σ phase. A cast and then rolled plate of the alloy was processed into four conditions by annealing for 10 and 30 min at 1100 °C and by friction stir processing (FSP) at tool rotation rates of 150 and 400 revolutions per minute (RPM) to facilitate detailed examinations of variable initial grain structures. Neutron diffraction and electron microscopy were employed to characterize the microstructure and texture evolution. The initial materials had variable grain size but nearly 100% γ structure. Diffusionless strain induced γ→ε phase transformation took place under compression with higher rate initially and slower rate at the later stages of deformation, independent on the initial grain size. The transformation facilitated part of plastic strain accommodation and rapid strain hardening owing to a transformation-induced dynamic Hall-Petch-type barrier effect, increase in dislocation density, and texture. The peak strength of nearly 2 GPa was achieved under compression using the structure created by double pass FSP (150 RPM followed by 150 RPM). Remarkably, the tensile elongation exhibited by the alloy was nearly 20% with fracture surfaces featuring a combination of ductile dimples and cleavage.more » « less
-
A new type of high-entropy alloy, a nitride-based (AlCrTiZrMo)N/ZrO2 nano-multilayered film, was designed to investigate the effect of ZrO2 layer thickness on the microstructure, mechanical properties, and thermal stability. The results show that when the thickness of the ZrO2 layer is less than 0.6 nm, it can be transformed into cubic-phase growth under the template effect of the (AlCrTiZrMo)N layer, resulting in an increased hardness. The (AlCrTiZrMo)N/ZrO2 film with a ZrO2 layer thickness of 0.6 nm has the highest hardness and elastic modulus of 35.1 GPa and 376.4 GPa, respectively. As the thickness of the ZrO2 layer further increases, ZrO2 cannot maintain the cubic structure, and the epitaxial growth interface is destroyed, resulting in a decrease in hardness. High-temperature annealing treatments indicate that the mechanical properties of the film decrease slightly after annealing at less than 900 °C for 30 min, while the mechanical properties decrease significantly after annealing for 30 min at 1000–1100 °C. The hardness and elastic modulus after annealing at 900 °C are still 24.5 GPa and 262.3 GPa, showing excellent thermal stability. This conclusion verifies the “template” effect of the nano-multilayered film, which improves the hardness and thermal stability of the high-entropy alloy.more » « less
-
Gallium oxide (β-Ga 2 O 3 ) is becoming a popular material for high power electronic devices due to its wide bandgap and ease of processing. In this work, β-Ga 2 O 3 substrates received various annealing treatments before atomic layer deposition of HfO 2 and subsequent fabrication of metal–oxide–semiconductor (MOS) capacitors. Annealing of β-Ga 2 O 3 with forming gas or nitrogen produced degraded capacitance–voltage (C–V) behavior compared to a β-Ga 2 O 3 control sample with no annealing. A sample annealed with pure oxygen had improved C–V characteristics relative to the control sample, with a higher maximum capacitance and smaller flat-band voltage shift, indicating that oxygen annealing improved the C–V behavior. X-ray photoelectron spectroscopy also suggested a reduction in the oxygen vacancy concentration after O 2 annealing at 450 °C, which supports the improved C–V characteristics and indicates that O 2 annealing of β-Ga 2 O 3 may lead to better MOS device performance.more » « less