Dodson, J P, Holman, Nathan, Thorgrimsson, Brandur, Neyens, Samuel F, MacQuarrie, E R, McJunkin, Thomas, Foote, Ryan H, Edge, L F, Coppersmith, S N, and Eriksson, M A. Fabrication process and failure analysis for robust quantum dots in silicon. Retrieved from https://par.nsf.gov/biblio/10296438. Nanotechnology 31.50 Web. doi:10.1088/1361-6528/abb559.

Dodson, J P, Holman, Nathan, Thorgrimsson, Brandur, Neyens, Samuel F, MacQuarrie, E R, McJunkin, Thomas, Foote, Ryan H, Edge, L F, Coppersmith, S N, & Eriksson, M A. Fabrication process and failure analysis for robust quantum dots in silicon. Nanotechnology, 31 (50). Retrieved from https://par.nsf.gov/biblio/10296438. https://doi.org/10.1088/1361-6528/abb559

Dodson, J P, Holman, Nathan, Thorgrimsson, Brandur, Neyens, Samuel F, MacQuarrie, E R, McJunkin, Thomas, Foote, Ryan H, Edge, L F, Coppersmith, S N, and Eriksson, M A. "Fabrication process and failure analysis for robust quantum dots in silicon". Nanotechnology 31 (50). Country unknown/Code not available. https://doi.org/10.1088/1361-6528/abb559. https://par.nsf.gov/biblio/10296438.

@article{osti_10296438,
place = {Country unknown/Code not available}, title = {Fabrication process and failure analysis for robust quantum dots in silicon}, url = {https://par.nsf.gov/biblio/10296438}, DOI = {10.1088/1361-6528/abb559}, abstractNote = {}, journal = {Nanotechnology}, volume = {31}, number = {50}, author = {Dodson, J P and Holman, Nathan and Thorgrimsson, Brandur and Neyens, Samuel F and MacQuarrie, E R and McJunkin, Thomas and Foote, Ryan H and Edge, L F and Coppersmith, S N and Eriksson, M A}, editor = {null} }