Search for: All records

Epitaxial growth of complex oxides on large-area wafers, such as sapphire and silicon, represents a key step toward scalable oxide device production. Solid phase epitaxy allows the synthesis of γ-Al2O3 on α-Al2O3 and provides a template with a matched lattice constant and appropriate cubic symmetry for subsequent heteroepitaxial growth of perovskite complex oxides. Nb-doped SrTiO3 thin films were deposited epitaxially on (111)-oriented γ-Al2O3 intermediate layers on (0001) c-axis-oriented sapphire α-Al2O3 crystals using pulsed laser deposition. The Nb:SrTiO3 thin films with a thickness of 53 nm, grown at 700 °C on γ-Al2O3, reached fully relaxed lattice parameters and were epitaxially oriented with respect to the substrate. Nb:SrTiO3 layers deposited using identical deposition conditions directly on α-Al2O3, without the γ-Al2O3 intermediate layer, were polycrystalline. The sheet conductivity of Nb:SrTiO3 grown on γ-Al2O3/α-Al2O3 is more than ten times higher than that of Nb:SrTiO3 grown directly on α-Al2O3 without the γ-Al2O3 layer. The results point to new directions for the integration of (111)-oriented pseudocubic perovskite complex oxides and the integration of epitaxial complex oxides over larger areas using α-Al2O3 single-crystal substrates. 

The crystallization of complex oxide thin films on amorphous substrates presents a significant challenge because of the lack of long-range order in these substrates and the subsequent difficulty in controlling crystal growth. Nanocrystals with similar crystal structure have the potential to serve as nucleation sites for crystallization and can facilitate this integration. Isolated nanocrystals of strontium titanate (SrTiO3) can be produced on amorphous SiO2 surfaces through crystallization and ripening of initially amorphous layers of SrTiO3. The resulting SrTiO3 nanocrystals exhibit characteristic lateral radii ranging from tens to hundreds of nm and a consistent average height of 1–2 nm across this range. The area density and mean radii of the nanocrystals can be selected by adjusting the deposition and heating parameters, including the amount of deposited SrTiO3 and the heating duration. The heating-time dependence of the area density and mean radii of the nanocrystals is consistent with predictions based on Ostwald ripening kinetics. The selection of these parameters facilitates the use of SrTiO3 nanocrystals as nucleation sites to crystallize the subsequently deposited layer. 

Physical vapor deposition (PVD) provides a route to prepare highly stable and anisotropic organic glasses that are utilized in multi-layer structures such as organic light-emitting devices. While previous work has demonstrated that anisotropic glasses with uniaxial symmetry can be prepared by PVD, here, we prepare biaxially aligned glasses in which molecular orientation has a preferred in-plane direction. With the collective effect of the surface equilibration mechanism and template growth on an aligned substrate, macroscopic biaxial alignment is achieved in depositions as much as 180 K below the clearing point TLC−iso (and 50 K below the glass transition temperature Tg) with single-component disk-like (phenanthroperylene ester) and rod-like (itraconazole) mesogens. The preparation of biaxially aligned organic semiconductors adds a new dimension of structural control for vapor-deposited glasses and may enable polarized emission and in-plane control of charge mobility. 

Amorphous BaTiO3 layers deposited on SrTiO3 (001) substrates at room temperature were subsequently crystallized using solid phase epitaxy (SPE). Heating an initially amorphous BaTiO3 layer in air at 650 °C for 3 h resulted in crystallization with components in two distinct crystallographic orientation relationships with respect to the substrate. Part of the volume of the BaTiO3 layer crystallized in a cube-on-cube relationship with the substrate. Other volumes crystallized in four variants of a 70.5° rotation about ⟨110⟩, resulting in a ⟨221⟩ surface normal in each case. Each of these four variants forms a Σ = 3 coincident site lattice with respect to the SrTiO3 substrate and the cube-on-cube oriented BaTiO3. Heating for the same duration and temperature in a reducing gas atmosphere resulted in the formation of polycrystalline BaTiO3 with no preferred crystallographic orientation. The dependence on the gas atmosphere indicates that it may be possible to tune the annealing time, temperature, and atmosphere to produce a single crystalline BTO on STO by SPE or produce a desired distribution of orientations. 

ScAlMgO4 (SAM) is a promising substrate material for group III-nitride semiconductors. SAM has a lower lattice mismatch with III-nitride materials compared to conventionally used sapphire (Al2O3) and silicon substrates. Bulk SAM substrate has the issues of high cost and lack of large area substrates. Utilizing solid-phase epitaxy to transform an amorphous SAM on a sapphire substrate into a crystalline form is a cost-efficient and scalable approach. Amorphous SAM layers were deposited on 0001-oriented Al2O3 by sputtering and crystallized by annealing at a temperature greater than 850 °C. Annealing under suboptimal annealing conditions results in a larger volume fraction of a competing spinel phase (MgAl2O4) exhibiting themselves as crystal facets on the subsequently grown InGaN layers during MOCVD growth. InGaN on SAM layers demonstrated both a higher intensity and emission redshift compared to the co-loaded InGaN on GaN on sapphire samples, providing a promising prospect for achieving efficient longer-wavelength emitters.