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Abstract 17 MeV proton irradiation at fluences from 3–7 × 1013cm−2of vertical geometry NiO/β-Ga2O3heterojunction rectifiers produced carrier removal rates in the range 120–150 cm−1in the drift region. The forward current density decreased by up to 2 orders of magnitude for the highest fluence, while the reverse leakage current increased by a factor of ∼20. Low-temperature annealing methods are of interest for mitigating radiation damage in such devices where thermal annealing is not feasible at the temperatures needed to remove defects. While thermal annealing has previously been shown to produce a limited recovery of the damage under these conditions, athermal annealing by minority carrier injection from NiO into the Ga2O3has not previously been attempted. Forward bias annealing produced an increase in forward current and a partial recovery of the proton-induced damage. Since the minority carrier diffusion length is 150–200 nm in proton irradiated Ga2O3, recombination-enhanced annealing of point defects cannot be the mechanism for this recovery, and we suggest that electron wind force annealing occurs.
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Effect of Electron Injection on Minority Carrier Transport in 10 MeV Proton Irradiated β-Ga 2 O 3 Schottky Rectifiers
We report the effect of extended duration electron beam exposure on the minority carrier transport properties of 10 MeV proton irradiated (fluence ∼1014cm−2) Si-dopedβ-Ga2O3Schottky rectifiers. The diffusion length (L) of minority carriers is found to decrease with temperature from 330 nm at 21 °C to 289 nm at 120 °C, with an activation energy of ∼26 meV. This energy corresponds to the presence of shallow Si trap-levels. Extended duration electron beam exposure enhancesLfrom 330 nm to 726 nm at room temperature. The rate of increase forLis lower with increased temperature, with an activation energy of 43 meV. Finally, a brief comparison of the effect of electron injection on proton irradiated, alpha-particle irradiated and a reference Si-dopedβ-Ga2O3Schottky rectifiers is presented.
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- Award ID(s):
- 1802208
- PAR ID:
- 10303349
- Publisher / Repository:
- The Electrochemical Society
- Date Published:
- Journal Name:
- ECS Journal of Solid State Science and Technology
- Volume:
- 9
- Issue:
- 4
- ISSN:
- 2162-8769
- Page Range / eLocation ID:
- Article No. 045018
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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