A knowledge-based understanding of the plasma-surface-interaction with the aim to precisely control (reactive) sputtering processes for the deposition of thin films with tailored and reproducible properties is highly desired for industrial applications. In order to understand the effect of plasma parameter variations on the film properties, a single plasma parameter needs to be varied, while all other process and plasma parameters should remain constant. In this work, we use the Electrical Asymmetry Effect in a multi-frequency capacitively coupled plasma to control the ion energy at the substrate without affecting the ion-to-growth flux ratio by adjusting the relative phase betweenmore »
The angular dependence of the microwave-driven spin rectification (SR) effect in single crystalline Co0.5Fe0.5alloy film is systematically investigated. Due to the strong current-orientation dependent anisotropic magnetoresistance (AMR), the SR effects in CoFe film strongly deviate from the ordinary sin 2
- Publication Date:
- NSF-PAR ID:
- 10303692
- Journal Name:
- New Journal of Physics
- Volume:
- 22
- Issue:
- 9
- Page Range or eLocation-ID:
- Article No. 093047
- ISSN:
- 1367-2630
- Publisher:
- IOP Publishing
- Sponsoring Org:
- National Science Foundation
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