Poddar, Preeti K., Zhong, Yu, Mannix, Andrew J., Mujid, Fauzia, Yu, Jaehyung, Liang, Ce, Kang, Jong-Hoon, Lee, Myungjae, Xie, Saien, and Park, Jiwoong. Resist-Free Lithography for Monolayer Transition Metal Dichalcogenides. Retrieved from https://par.nsf.gov/biblio/10325356. Nano Letters 22.2 Web. doi:10.1021/acs.nanolett.1c04081.

Poddar, Preeti K., Zhong, Yu, Mannix, Andrew J., Mujid, Fauzia, Yu, Jaehyung, Liang, Ce, Kang, Jong-Hoon, Lee, Myungjae, Xie, Saien, & Park, Jiwoong. Resist-Free Lithography for Monolayer Transition Metal Dichalcogenides. Nano Letters, 22 (2). Retrieved from https://par.nsf.gov/biblio/10325356. https://doi.org/10.1021/acs.nanolett.1c04081

Poddar, Preeti K., Zhong, Yu, Mannix, Andrew J., Mujid, Fauzia, Yu, Jaehyung, Liang, Ce, Kang, Jong-Hoon, Lee, Myungjae, Xie, Saien, and Park, Jiwoong. "Resist-Free Lithography for Monolayer Transition Metal Dichalcogenides". Nano Letters 22 (2). Country unknown/Code not available. https://doi.org/10.1021/acs.nanolett.1c04081. https://par.nsf.gov/biblio/10325356.

@article{osti_10325356,
place = {Country unknown/Code not available}, title = {Resist-Free Lithography for Monolayer Transition Metal Dichalcogenides}, url = {https://par.nsf.gov/biblio/10325356}, DOI = {10.1021/acs.nanolett.1c04081}, abstractNote = {}, journal = {Nano Letters}, volume = {22}, number = {2}, author = {Poddar, Preeti K. and Zhong, Yu and Mannix, Andrew J. and Mujid, Fauzia and Yu, Jaehyung and Liang, Ce and Kang, Jong-Hoon and Lee, Myungjae and Xie, Saien and Park, Jiwoong}, }