Engineering electronic bandgaps is crucial for applications in information technology, sensing, and renewable energy. Transition metal dichalcogenides (TMDCs) offer a versatile platform for bandgap modulation through alloying, doping, and heterostructure formation. Here, the synthesis of a 2D MoxW1‐xS2graded alloy is reported, featuring a Mo‐rich center that transitions to W‐rich edges, achieving a tunable bandgap of 1.85 to 1.95 eV when moving from the center to the edge of the flake. Aberration‐corrected high‐angle annular dark‐field scanning transmission electron microscopy showed the presence of sulfur monovacancy, VS, whose concentration varied across the graded MoxW1‐xS2layer as a function of Mo content with the highest value in the Mo‐rich center region. Optical spectroscopy measurements supported by ab initio calculations reveal a doublet electronic state of VS, which is split due to the spin‐orbit interaction, with energy levels close to the conduction band or deep in the bandgap depending on whether the vacancy is surrounded by W atoms or Mo atoms. This unique electronic configuration of VSin the alloy gave rise to four spin‐allowed optical transitions between the VSlevels and the valence bands. The study demonstrates the potential of defect and optical engineering in 2D monolayers for advanced device applications.
Spatially Composition-graded Monolayer WSe2xTe2−2x Nanosheets
Alloying in two-dimensional (2D) transition metal dichalcogenides (TMD) has allowed bandgap engineering and phase transformation, which provide more flexibility and functionality for electronic and photonic devices. To date, many ternary TMD alloys with homogenous compositions have been synthesized. However, realization of bandgap modulation spatially within a single TMD nanosheet remains largely unexplored. In this work, we demonstrate the synthesis of spatially composition-graded WSe2xTe2-2x flakes using an in situ chemical vapor deposition method. The photoluminescence and Raman spectra line-scanning characterization indicate a spatially graded bandgap, which increases from 1.46 eV (center) to 1.61 eV (edge) within one monolayer flake. Furthermore, the electronic devices based on this spatially graded material exhibit tunable transfer characteristics.
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- Award ID(s):
- 1653241
- NSF-PAR ID:
- 10328633
- Date Published:
- Journal Name:
- 52th IEEE Semiconductor Interface Specialists Conference
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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Binary and ternary transition metal dichalcogenide (TMD) heterostructures, MSe2and MSeS (where M = Mo or W), are investigated as future building blocks for high‐performance device applications with a tailorable electronic bandgap. For light‐emitting device applications, investigating the decay time of the material is a prerequisite. Herein, time‐resolved photoluminescence (TRPL) of binary and ternary TMD heterostructures is measured. A tri‐exponential function is adopted to fit the TRPL data. Short, medium, and long decay times are <50 ps, ≈400 ps, and >400 ps, respectively. Except for monolayer MoSe2and MoSeS, only two PL decay time components are observed with a large contribution from short decay time photocarriers (>80%). Bilayer TMDs exhibit a much shorter PL decay time, which could be attributed to the indirect nature of excitons and different dielectric environments, compared with that of monolayer TMDs. Using the center‐of‐mass (CM) method, a PL decay time map is successfully obtained for binary and ternary TMD heterostructures. This allows the qualitative visualization of the decay time distribution within the heterostructure or among other materials. This technique could be applied to assess the decay time of materials used in high‐performance light‐emitting devices.
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Two-dimensional semiconductors (2DSCs) are attractive for a variety of optoelectronic and catalytic applications due to their ability to be fabricated as wide-area, monolayer-thick films and their unique optical and electronic properties which emerge at this scale. One important class of 2DSCs are the transition metal dichalcogenides (TMDs), which are of particular interest as absorbing layers in ultrathin optoelectronic devices. While TMDs are known to exhibit excellent photovoltaic properties at the bulk level, it is not yet clear how carriers are transported in these materials at thicknesses approaching the monolayer limit, where distinct changes in band structure and the nature of photogenerated carriers occur. Here, it is demonstrated that electrochemical microscopy techniques can be employed as powerful tools for visualizing these processes in 2DSCs, even within individual monolayers. Carrier generation-tip collection scanning electrochemical cell microscopy (CG-TC SECCM), which utilizes spatially-offset optical and pipet-based electrochemical probes to locally generate and detect photogenerated carriers, was applied to visualize carrier generation and transport within well-defined n-WSe 2 samples prepared via mechanical exfoliation. Data from these experiments directly reveal how carrier transport varies within complex 2DSC structures as layer thicknesses approach the monolayer limit. These results not only provide valuable new insights into carrier transport within monolayer TMD materials, but also demonstrate electrochemical imaging to be a powerful, yet underutilized approach for visualizing solid-state processes in semiconducting materials.more » « less
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null (Ed.)Gallium oxide (Ga 2 O 3 ) and its most stable modification, monoclinic β-Ga 2 O 3 , is emerging as a primary material for power electronic devices, gas sensors and optical devices due to a high breakdown voltage, large bandgap, and optical transparency combined with electrical conductivity. Growth of β-Ga 2 O 3 is challenging and most methods require very high temperatures. Nanowires of β-Ga 2 O 3 have been investigated extensively as they might be advantageous for devices such as nanowire field effect transistors, and gas sensors benefiting from a large surface to volume ratio, among others. Here, we report a synthesis approach using a sulfide precursor (Ga 2 S 3 ), which requires relatively low substrate temperatures and short growth times to produce high-quality single crystalline β-Ga 2 O 3 nanowires in high yields. Even though Au- or Ag-rich nanoparticles are invariably observed at the nanowire tips, they merely serve as nucleation seeds while the nanowire growth proceeds via supply and local oxidation of gallium at the substrate interface. Absorption and cathodoluminescence spectroscopy on individual nanowires confirms a wide bandgap of 4.63 eV and strong luminescence with a maximum ∼2.7 eV. Determining the growth process, morphology, composition and optoelectronic properties on the single nanowire level is key to further application of the β-Ga 2 O 3 nanowires in electronic devices.more » « less
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Resonant tunneling diodes (RTDs) have come full-circle in the past 10 years after their demonstration in the early 1990s as the fastest room-temperature semiconductor oscillator, displaying experimental results up to 712 GHz and fmax values exceeding 1.0 THz [1]. Now the RTD is once again the preeminent electronic oscillator above 1.0 THz and is being implemented as a coherent source [2] and a self-oscillating mixer [3], amongst other applications. This paper concerns RTD electroluminescence – an effect that has been studied very little in the past 30+ years of RTD development, and not at room temperature. We present experiments and modeling of an n-type In0.53Ga0.47As/AlAs double-barrier RTD operating as a cross-gap light emitter at ~300K. The MBE-growth stack is shown in Fig. 1(a). A 15-μm-diam-mesa device was defined by standard planar processing including a top annular ohmic contact with a 5-μm-diam pinhole in the center to couple out enough of the internal emission for accurate free-space power measurements [4]. The emission spectra have the behavior displayed in Fig. 1(b), parameterized by bias voltage (VB). The long wavelength emission edge is at = 1684 nm - close to the In0.53Ga0.47As bandgap energy of Ug ≈ 0.75 eV at 300 K. The spectral peaks for VB = 2.8 and 3.0 V both occur around = 1550 nm (h = 0.75 eV), so blue-shifted relative to the peak of the “ideal”, bulk InGaAs emission spectrum shown in Fig. 1(b) [5]. These results are consistent with the model displayed in Fig. 1(c), whereby the broad emission peak is attributed to the radiative recombination between electrons accumulated on the emitter side, and holes generated on the emitter side by interband tunneling with current density Jinter. The blue-shifted main peak is attributed to the quantum-size effect on the emitter side, which creates a radiative recombination rate RN,2 comparable to the band-edge cross-gap rate RN,1. Further support for this model is provided by the shorter wavelength and weaker emission peak shown in Fig. 1(b) around = 1148 nm. Our quantum mechanical calculations attribute this to radiative recombination RR,3 in the RTD quantum well between the electron ground-state level E1,e, and the hole level E1,h. To further test the model and estimate quantum efficiencies, we conducted optical power measurements using a large-area Ge photodiode located ≈3 mm away from the RTD pinhole, and having spectral response between 800 and 1800 nm with a peak responsivity of ≈0.85 A/W at =1550 nm. Simultaneous I-V and L-V plots were obtained and are plotted in Fig. 2(a) with positive bias on the top contact (emitter on the bottom). The I-V curve displays a pronounced NDR region having a current peak-to-valley current ratio of 10.7 (typical for In0.53Ga0.47As RTDs). The external quantum efficiency (EQE) was calculated from EQE = e∙IP/(∙IE∙h) where IP is the photodiode dc current and IE the RTD current. The plot of EQE is shown in Fig. 2(b) where we see a very rapid rise with VB, but a maximum value (at VB= 3.0 V) of only ≈2×10-5. To extract the internal quantum efficiency (IQE), we use the expression EQE= c ∙i ∙r ≡ c∙IQE where ci, and r are the optical-coupling, electrical-injection, and radiative recombination efficiencies, respectively [6]. Our separate optical calculations yield c≈3.4×10-4 (limited primarily by the small pinhole) from which we obtain the curve of IQE plotted in Fig. 2(b) (right-hand scale). The maximum value of IQE (again at VB = 3.0 V) is 6.0%. From the implicit definition of IQE in terms of i and r given above, and the fact that the recombination efficiency in In0.53Ga0.47As is likely limited by Auger scattering, this result for IQE suggests that i might be significantly high. To estimate i, we have used the experimental total current of Fig. 2(a), the Kane two-band model of interband tunneling [7] computed in conjunction with a solution to Poisson’s equation across the entire structure, and a rate-equation model of Auger recombination on the emitter side [6] assuming a free-electron density of 2×1018 cm3. We focus on the high-bias regime above VB = 2.5 V of Fig. 2(a) where most of the interband tunneling should occur in the depletion region on the collector side [Jinter,2 in Fig. 1(c)]. And because of the high-quality of the InGaAs/AlAs heterostructure (very few traps or deep levels), most of the holes should reach the emitter side by some combination of drift, diffusion, and tunneling through the valence-band double barriers (Type-I offset) between InGaAs and AlAs. The computed interband current density Jinter is shown in Fig. 3(a) along with the total current density Jtot. At the maximum Jinter (at VB=3.0 V) of 7.4×102 A/cm2, we get i = Jinter/Jtot = 0.18, which is surprisingly high considering there is no p-type doping in the device. When combined with the Auger-limited r of 0.41 and c ≈ 3.4×10-4, we find a model value of IQE = 7.4% in good agreement with experiment. This leads to the model values for EQE plotted in Fig. 2(b) - also in good agreement with experiment. Finally, we address the high Jinter and consider a possible universal nature of the light-emission mechanism. Fig. 3(b) shows the tunneling probability T according to the Kane two-band model in the three materials, In0.53Ga0.47As, GaAs, and GaN, following our observation of a similar electroluminescence mechanism in GaN/AlN RTDs (due to strong polarization field of wurtzite structures) [8]. The expression is Tinter = (2/9)∙exp[(-2 ∙Ug 2 ∙me)/(2h∙P∙E)], where Ug is the bandgap energy, P is the valence-to-conduction-band momentum matrix element, and E is the electric field. Values for the highest calculated internal E fields for the InGaAs and GaN are also shown, indicating that Tinter in those structures approaches values of ~10-5. As shown, a GaAs RTD would require an internal field of ~6×105 V/cm, which is rarely realized in standard GaAs RTDs, perhaps explaining why there have been few if any reports of room-temperature electroluminescence in the GaAs devices. [1] E.R. Brown,et al., Appl. Phys. Lett., vol. 58, 2291, 1991. [5] S. Sze, Physics of Semiconductor Devices, 2nd Ed. 12.2.1 (Wiley, 1981). [2] M. Feiginov et al., Appl. Phys. Lett., 99, 233506, 2011. [6] L. Coldren, Diode Lasers and Photonic Integrated Circuits, (Wiley, 1995). [3] Y. Nishida et al., Nature Sci. Reports, 9, 18125, 2019. [7] E.O. Kane, J. of Appl. Phy 32, 83 (1961). [4] P. Fakhimi, et al., 2019 DRC Conference Digest. [8] T. Growden, et al., Nature Light: Science & Applications 7, 17150 (2018). [5] S. Sze, Physics of Semiconductor Devices, 2nd Ed. 12.2.1 (Wiley, 1981). [6] L. Coldren, Diode Lasers and Photonic Integrated Circuits, (Wiley, 1995). [7] E.O. Kane, J. of Appl. Phy 32, 83 (1961). [8] T. Growden, et al., Nature Light: Science & Applications 7, 17150 (2018).more » « less
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