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  • Atomic Force Microscopy-Based Static Plowing Lithography Using CaCO 3 Nanoparticle Resist Layers as a Substrate-Flexible Selective Metal Deposition Resist
Title: Atomic Force Microscopy-Based Static Plowing Lithography Using CaCO 3 Nanoparticle Resist Layers as a Substrate-Flexible Selective Metal Deposition Resist
Award ID(s):
2108448
PAR ID:
10330076
Author(s) / Creator(s):
; ; ;
Date Published:
Journal Name:
The Journal of Physical Chemistry C
Volume:
125
Issue:
42
ISSN:
1932-7447
Page Range / eLocation ID:
23490 to 23500
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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