Sun, J., Lee, C., Osuji, C., and Gopalan, P. Synthesis of High Etch Contrast Poly(3-hydroxystyrene)-Based Triblock Copolymers and Self-Assembly of Sub-5 nm Features. Retrieved from https://par.nsf.gov/biblio/10332645. Macromolecules 54.20 Web. doi:10.1021/acs.macromol.1c01611.
Sun, J., Lee, C., Osuji, C., & Gopalan, P. Synthesis of High Etch Contrast Poly(3-hydroxystyrene)-Based Triblock Copolymers and Self-Assembly of Sub-5 nm Features. Macromolecules, 54 (20). Retrieved from https://par.nsf.gov/biblio/10332645. https://doi.org/10.1021/acs.macromol.1c01611
@article{osti_10332645,
place = {Country unknown/Code not available},
title = {Synthesis of High Etch Contrast Poly(3-hydroxystyrene)-Based Triblock Copolymers and Self-Assembly of Sub-5 nm Features},
url = {https://par.nsf.gov/biblio/10332645},
DOI = {10.1021/acs.macromol.1c01611},
abstractNote = {},
journal = {Macromolecules},
volume = {54},
number = {20},
author = {Sun, J. and Lee, C. and Osuji, C. and Gopalan, P},
}
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