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This content will become publicly available on October 11, 2022

Title: Synthesis of High Etch Contrast Poly(3-hydroxystyrene)-Based Triblock Copolymers and Self-Assembly of Sub-5 nm Features
Authors:
; ; ;
Award ID(s):
2003891
Publication Date:
NSF-PAR ID:
10332645
Journal Name:
Macromolecules
Volume:
54
Issue:
20
Page Range or eLocation-ID:
9542
ISSN:
1539-8870
Sponsoring Org:
National Science Foundation
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