Harpel, Allison, Um, Joseph, Dave, Aditya, Zhang, Yali, Mahjabeen, Nikita, Chen, Yicong, Henderson, Rashaunda, Franklin, Rhonda, and Stadler, Bethanie J. Vertically Integrated Nanowires on Si Wafers and Into Circuits. Retrieved from https://par.nsf.gov/biblio/10401492. IEEE Transactions on Magnetics 59.3 Web. doi:10.1109/TMAG.2022.3218696.

Harpel, Allison, Um, Joseph, Dave, Aditya, Zhang, Yali, Mahjabeen, Nikita, Chen, Yicong, Henderson, Rashaunda, Franklin, Rhonda, & Stadler, Bethanie J. Vertically Integrated Nanowires on Si Wafers and Into Circuits. IEEE Transactions on Magnetics, 59 (3). Retrieved from https://par.nsf.gov/biblio/10401492. https://doi.org/10.1109/TMAG.2022.3218696

Harpel, Allison, Um, Joseph, Dave, Aditya, Zhang, Yali, Mahjabeen, Nikita, Chen, Yicong, Henderson, Rashaunda, Franklin, Rhonda, and Stadler, Bethanie J. "Vertically Integrated Nanowires on Si Wafers and Into Circuits". IEEE Transactions on Magnetics 59 (3). Country unknown/Code not available. https://doi.org/10.1109/TMAG.2022.3218696. https://par.nsf.gov/biblio/10401492.

@article{osti_10401492,
place = {Country unknown/Code not available}, title = {Vertically Integrated Nanowires on Si Wafers and Into Circuits}, url = {https://par.nsf.gov/biblio/10401492}, DOI = {10.1109/TMAG.2022.3218696}, abstractNote = {}, journal = {IEEE Transactions on Magnetics}, volume = {59}, number = {3}, author = {Harpel, Allison and Um, Joseph and Dave, Aditya and Zhang, Yali and Mahjabeen, Nikita and Chen, Yicong and Henderson, Rashaunda and Franklin, Rhonda and Stadler, Bethanie J.}, }