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1. Integration of highly anisotropic multiferroic BaTiO 3 –Fe nanocomposite thin films on Si towards device applications

   https://doi.org/10.1039/d0na00405g  

   Kalaswad, Matias ; Zhang, Bruce ; Wang, Xuejing ; Wang, Han ; Gao, Xingyao ; Wang, Haiyan ( September 2020 , Nanoscale Advances)

   null (Ed.)

   Integration of highly anisotropic multiferroic thin films on silicon substrates is a critical step towards low-cost devices, especially high-speed and low-power consumption memories. In this work, an oxide–metal vertically aligned nanocomposite (VAN) platform has been used to successfully demonstrate self-assembled multiferroic BaTiO 3 –Fe (BTO–Fe) nanocomposite films with high structural anisotropy on Si substrates. The effects of various buffer layers on the crystallinity, microstructure, and physical properties of the BTO–Fe films have been explored. With an appropriate buffer layer design, e.g. SrTiO 3 /TiN bilayer buffer, the epitaxial quality of the BTO matrix and the anisotropy of the Fe nanopillars can be improved greatly, which in turn enhances the physical properties, including the ferromagnetic, ferroelectric, and optical response of the BTO–Fe thin films. This unique combination of properties integrated on Si offers a promising approach in the design of multifunctional nanocomposites for Si-based memories and optical devices. 

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2. 3D Hybrid Plasmonic Framework with Au Nanopillars Embedded in Nitride Multilayers Integrated on Si

   https://doi.org/10.1002/admi.202000493  

   Huang, Jijie ; Wang, Xuejing ; Li, Dongfang ; Jin, Tiening ; Lu, Ping ; Zhang, Di ; Lin, Pao‐Tai ; Chen, Hou‐Tong ; Narayan, Jagdish ; Zhang, Xinghang ; et al ( June 2020 , Advanced Materials Interfaces)

   Integration of nanoscale photonic and plasmonic components on Si substrates is a critical step toward Si‐based integrated nanophotonic devices. In this work, a set of unique complex 3D metamaterials with intercalated nanolayered and nanopillar structures with tunable plasmonic and optical properties on Si substrates is designed. More specifically, the 3D metamaterials combine metal (Au) nanopillars and alternating metal‐nitride (Au‐TiN and Au‐TaN) nanolayers, epitaxially grown on Si substrates. The ultrafine Au nanopillars (d≈ 3 nm) continuously grow throughout all the nanolayers with high epitaxial quality. Novel optical properties, such as highly anisotropic optical property, high absorbance covering the entire visible spectrum regime, and hyperbolic property in the visible regime, are demonstrated. Furthermore, a waveguide based on a silicon nitride (Si₃N₄) ridge with a multilayer structure is successfully fabricated. The demonstration of 3D nanoscale metamaterial design integrated on Si opens up a new route toward tunable metamaterials nanostructure designs with versatile material selection for various optical components in Si integrated photonics.

    

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3. Self-assembled HfO 2 -Au nanocomposites with ultra-fine vertically aligned Au nanopillars

   https://doi.org/10.1039/D2NR03104C  

   Zhang, Yizhi ; Zhang, Di ; Liu, Juncheng ; Lu, Ping ; Deitz, Julia ; Shen, Jianan ; He, Zihao ; Zhang, Xinghang ; Wang, Haiyan ( August 2022 , Nanoscale)

   Oxide-metal-based hybrid materials have gained great research interest in recent years owing to their potential for multifunctionality, property coupling, and tunability. Specifically, oxide-metal hybrid materials in a vertically aligned nanocomposite (VAN) form could produce pronounced anisotropic physical properties, e.g. , hyperbolic optical properties. Herein, self-assembled HfO 2 -Au nanocomposites with ultra-fine vertically aligned Au nanopillars (as fine as 3 nm in diameter) embedded in a HfO 2 matrix were fabricated using a one-step self-assembly process. The film crystallinity and pillar uniformity can be obviously improved by adding an ultra-thin TiN-Au buffer layer during the growth. The HfO 2 -Au hybrid VAN films show an obvious plasmonic resonance at 480 nm, which is much lower than the typical plasmonic resonance wavelength of Au nanostructures, and is attributed to the well-aligned ultra-fine Au nanopillars. Coupled with the broad hyperbolic dispersion ranging from 1050 nm to 1800 nm in wavelength, and unique dielectric HfO 2 , this nanoscale hybrid plasmonic metamaterial presents strong potential for the design of future integrated optical and electronic switching devices. 

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4. TiN‐Au/HfO 2 ‐Au Multilayer Thin Films with Tunable Hyperbolic Optical Response

   https://doi.org/10.1002/smtd.202400087  

   Zhang, Yizhi ; Shen, Jianan ; Tsai, Benson Kunhung ; Sheng, Xuanyu ; Hu, Zedong ; Zhang, Xinghang ; Wang, Haiyan ( March 2024 , Small Methods)

   Hyperbolic metamaterials (HMM) possess significant anisotropic physical properties and tunability and thus find many applications in integrated photonic devices. HMMs consisting of metal and dielectric phases in either multilayer or vertically aligned nanocomposites (VAN) form are demonstrated with different hyperbolic properties. Herein, self‐assembled HfO₂‐Au/TiN‐Au multilayer thin films, combining both the multilayer and VAN designs, are demonstrated. Specifically, Au nanopillars embedded in HfO₂and TiN layers forming the alternative layers of HfO₂‐Au VAN and TiN‐Au VAN. The HfO₂and TiN layer thickness is carefully controlled by varying laser pulses during pulsed laser deposition (PLD). Interestingly, tunable anisotropic physical properties can be achieved by adjusting the bi‐layer thickness and the number of the bi‐layers. Type II optical hyperbolic dispersion can be obtained from high layer thickness structure (e.g., 20 nm), while it can be transformed into Type I optical hyperbolic dispersion by reducing the thickness to a proper value (e.g., 4 nm). This new nanoscale hybrid metamaterial structure with the three‐phase VAN design shows great potential for tailorable optical components in future integrated devices.

    

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5. A Platform for Complementary Metal‐Oxide‐Semiconductor Compatible Plasmonics: High Plasmonic Quality Titanium Nitride Thin Films on Si (001) with a MgO Interlayer

   https://doi.org/10.1002/adpr.202000210  

   Ding, Kai ; Fomra, Dhruv ; Kvit, Alexander V. ; Morkoç, Hadis ; Kinsey, Nathaniel ; Özgür, Ümit ; Avrutin, Vitaliy ( May 2021 , Advanced Photonics Research)

   Titanium nitride (TiN) is highly attractive for plasmonics and nanophotonics applications owing to its gold‐like but tunable optical properties. Its prodigious potential for plasmonics has been demonstrated on sapphire or bulk MgO. For a transformational impact, high optical quality TiN on Si is required instead, which would support the integration of nanophotonics with the complementary metal‐oxide‐semiconductor (CMOS) electronics. However, TiN grown on Si, even at elevated temperatures, lacks the optical quality needed, imposed by the large lattice mismatch between them. Here, a novel approach is reported wherein a thin MgO interlayer is inserted between TiN and Si. The improved crystalline quality enabled by MgO for TiN on Si(001) leads to a significant enhancement of the plasmonic figure of merit (FOM = −ε′/ε″) from 2.0 to 2.5 at telecommunication wavelength (peak FOM of 2.8), which is comparable to the widely accepted ultimate FOM obtained on bulk MgO grown under similar conditions. The TiN/MgO/Si structure enables the hybrid‐plasmonic‐photonic waveguide platform with sufficiently low losses, and thus long propagation lengths, for nanophotonic devices while providing additional practical advantages such as serving as a self‐aligned robust etching mask. Thus, the much‐anticipated potential of TiN on Si platform for CMOS compatible plasmonics is brought closer to reality.

    

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