GaN samples were implanted with Be and annealed in different conditions in order to activate the shallow Be Ga acceptor. Low-temperature photoluminescence spectra were studied to find Be Ga -related defects in the implanted samples. A yellow band with a maximum at about 2.2 eV (the YL Be band) was observed in nearly all samples protected with an AlN cap during the annealing and in samples annealed under ultrahigh N 2 pressure. A green band with a maximum at 2.35 eV (the GL2 band), attributed to the nitrogen vacancy, was the dominant defect-related luminescence band in GaN samples annealed without a protective AlN layer. The ultraviolet luminescence (UVL Be ) band with a maximum at 3.38 eV attributed to the shallow Be Ga acceptor with the ionization energy of 0.113 eV appeared in implanted samples only after annealing at high temperatures and ultrahigh N 2 pressure. This is the first observation of the UVL Be band in Be-implanted GaN, indicating successful activation of the Be Ga acceptor.
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Photoluminescence from GaN Implanted with Be and F
GaN samples were implanted with Be and F and annealed in different conditions to activate the BeGa acceptors. Photoluminescence spectra were studied to recognize the defects. The UVLBe band with a maximum at 3.38 eV and the YLBe band with a maximum at 2.15 eV were observed and associated with Be. The sequential implantation of Be and F ions into GaN at 600 °C reduces the concentration of nitrogen vacancies (VN), as evidenced by the lack of the green luminescence band associated with the isolated nitrogen vacancy. First‐principles calculations were employed to find parameters of defects that can form after implantation.
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- Award ID(s):
- 1904861
- PAR ID:
- 10429919
- Date Published:
- Journal Name:
- physica status solidi (b)
- ISSN:
- 0370-1972
- Page Range / eLocation ID:
- 2300131
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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