- PAR ID:
- 10442666
- Publisher / Repository:
- IEEE
- Date Published:
- ISBN:
- 978-1-6654-9418-2
- Page Range / eLocation ID:
- 1-3
- Subject(s) / Keyword(s):
- distributed amplifier frequency doubler millimeter wave MMIC power combining substrate integrated waveguide
- Format(s):
- Medium: X
- Location:
- Taipei, Taiwan
- Sponsoring Org:
- National Science Foundation
More Like this
-
This paper demonstrates the monolithic integration of a substrate-integrated waveguide bandpass filter (BPF) and a low-noise amplifier (LNA) at F-band, fabricated in a 70-nm GaN-on-SiC technology. The three-stage LNA alone achieves a state-of-the-art average noise figure of 3.6 dB over 87–115 GHz. The LNA + BPF exhibits a peak gain of 13.6 dB over a 3 dB bandwidth of 17 GHz from 104 to 121 GHz. The average noise figure is 4.9 dB over 87–115 GHz. The OP1 dB and saturated output power are 17.6dBm and >20 dBm, respectively.more » « less
-
This article presents a novel architecture of load-modulated balanced amplifier (LMBA) with a unique load-modulation characteristic different from any existing LMBAs and Doherty power amplifiers (DPAs), which is named pseudo-Doherty LMBA (PD-LMBA). Based on a special combination of control amplifier (carrier) and balanced amplifier (peaking) together with proper phase and amplitude controls, an optimal load-modulation behavior can be achieved for PD-LMBA, leading to maximized efficiency over extended power back-off range. More importantly, the efficiency optimization can be achieved with only a static setting of phase offset at a given frequency, which greatly simplifies the complexity for phase control. Furthermore, the cooperations of the carrier and peaking amplifiers in PD-LMBA are fully decoupled, thus lifting the fundamental bandwidth barrier imposed on the Doherty-based active load modulation. Upon theoretical proof of these discoveries, a wideband RF-input PD-LMBA is physically developed using the GaN technology for experimental demonstration. The prototype achieves a highly efficient performance from 1.5 to 2.7 GHz, e.g., 58%–72% of efficiency at 42.5-dBm peak power and 47%–58% at 10-dB output back-off (OBO). When stimulated by a 10-MHz long term evolution (LTE) signal with a 9.5-dB peak-to-average power ratio (PAPR), the developed PD-LMBA achieves an efficiency of 44%–53% over the entire bandwidth at an average output power of around 33 dBm.more » « less
-
Aluminum nitride (AlN) offers novel potential for electronic integration and performance benefits for high‐power, millimeter‐wave amplification. Herein, load‐pull power performance at 30 and 94 GHz for AlN/GaN/AlN high‐electron‐mobility transistors (HEMTs) on silicon carbide (SiC) is reported. When tuned for peak power‐added efficiency (PAE), the reported AlN/GaN/AlN HEMT shows PAE of 25% and 15%, with associated output power () of 2.5 and 1.7 W mm−1, at 30 and 94 GHz, respectively. At 94 GHz, the maximum generated is 2.2 W mm−1, with associated PAE of 13%.
-
An analytic theory for dual-input outphasing power amplifiers that incorporate in one unified treatment, the continuum of solutions for power combining including the Doherty and Chireix modes is presented. This unified theory developed at the current-source reference planes reveals the performance trade-off achieved by all of the possible power amplifier (PA) combiners within the continuum of solutions. Furthermore, it identifies a novel type of dual-input hybrid Chireix-Doherty PA that combines key features of the Doherty and Chireix operations such that the fundamental drain voltages applied to both the main and auxiliary transistors remain constant. This hybrid PA relies on an input outphasing angle varying with the input power level to obtain the correct load modulation behavior. A 2-GHz dual-input hybrid Chireix-Doherty PA is implemented using nonlinear embedding and experimentally evaluated to validate the theory. A drain efficiency of 61% at 9-dB backoff power and a maximum output power of about 43 dBm are obtained for continuous-wave (CW) measurements. The efficiency increases monotonously with output power unlike that of the Doherty PA used for comparison. When excited with a 20-MHz LTE signal with 9.5-dB peak-to-average power ratio (PAPR), the dual-input PA yields a 60.0% average drain efficiency and -48.1-dBc adjacent-channel power-leakage ratio (ACLR) after linearization.more » « less
-
The recent demonstration of W mm−1output power at 94 GHz in AlN/GaN/AlN high‐electron‐mobility transistors (HEMTs) has established AlN as a promising platform for millimeter‐wave electronics. The current state‐of‐art AlN HEMTs using ex situ‐deposited silicon nitride (SiN) passivation layers suffer from soft gain compression due to trapping of carriers by surface states. Reducing surface state dispersion in these devices is thus desired to access higher output powers. Herein, a potential solution using a novel in situ crystalline AlN passivation layer is provided. A thick, 30+ nm‐top AlN passivation layer moves the as‐grown surface away from the 2D electron gas (2DEG) channel and reduces its effect on the device. Through a series of metal‐polar AlN/GaN/AlN heterostructure growths, it is found that pseudomorphically strained 15 nm thin GaN channels are crucial to be able to grow thick AlN barriers without cracking. The fabricated recessed‐gate HEMTs on an optimized heterostructure with 50 nm AlN barrier layer and 15 nm GaN channel layer show reduction in dispersion down to compared with in current state‐of‐art ex situ SiN‐passivated HEMTs. These results demonstrate the efficacy of this unique in situ crystalline AlN passivation technique and should unlock higher mm‐wave powers in next‐generation AlN HEMTs.