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Title: Assessment of 1/ f noise associated with nanopores fabricated through chemically tuned controlled dielectric breakdown
Abstract

Recently, we developed a fabrication method—chemically‐tuned controlled dielectric breakdown (CT‐CDB)—that produces nanopores (through thin silicon nitride membranes) surpassing legacy drawbacks associated with solid‐state nanopores (SSNs). However, the noise characteristics of CT‐CDB nanopores are largely unexplored. In this work, we investigated the 1/fnoise of CT‐CDB nanopores of varying solution pH, electrolyte type, electrolyte concentration, applied voltage, and pore diameter. Our findings indicate that the bulk Hooge parameter (αb) is about an order of magnitude greater than SSNs fabricated by transmission electron microscopy (TEM) while the surface Hooge parameter (αs) is ∼3 order magnitude greater. Theαsof CT‐CDB nanopores was ∼5 orders of magnitude greater than theirαb, which suggests that the surface contribution plays a dominant role in 1/fnoise. Experiments with DNA exhibited increasing capture rates with pH up to pH ∼8 followed by a drop at pH ∼9 perhaps due to the onset of electroosmotic force acting against the electrophoretic force. The1/fnoise was also measured for several electrolytes and LiCl was found to outperform NaCl, KCl, RbCl, and CsCl. The 1/fnoise was found to increase with the increasing electrolyte concentration and pore diameter. Taken together, the findings of this work suggest the pH approximate 7–8 range to be optimal for DNA sensing with CT‐CDB nanopores.

 
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Award ID(s):
2022398 2022374
NSF-PAR ID:
10452154
Author(s) / Creator(s):
 ;  ;  ;  ;  
Publisher / Repository:
Wiley Blackwell (John Wiley & Sons)
Date Published:
Journal Name:
ELECTROPHORESIS
Volume:
42
Issue:
7-8
ISSN:
0173-0835
Page Range / eLocation ID:
p. 899-909
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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    Acknowledgment

    This work was partially supported by the U.S. National Science Foundation (NSF) Award No. ECCS-1931088. S.L. and H.W.S. acknowledge the support from the Improvement of Measurement Standards and Technology for Mechanical Metrology (Grant No. 22011044) by KRISS.

    Figure 1

     

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