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This content will become publicly available on October 16, 2024

Title: Polypeptoids: Exploring the Power of Sequence Control in a Photoresist for Extreme‐Ultraviolet Lithography
Abstract

A new type of a positive tone chemically amplified photoresist based on well‐defined, sequence‐controlled polypeptoids with ten repeat‐units are synthesized and their potential for extreme‐UV lithography (EUVL) is demonstrated, resulting in line‐space patterns of 70 nm pitch. The synthesized samples contain 4‐(ethyl) phenol (Eph) and propyne (Ppy) side chains, while their change in solubility upon exposure is induced by the deprotection of 4‐(ethyl) phenol side groups. The resist performance is evaluated using deep UV and extreme‐UV lithography. While all samples are developable in isopropyl alcohol, the content, and the sequence of hydrophobic alkyne side chains lead to a detectable change in solubility, dissolution rate, and resist performance.

 
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NSF-PAR ID:
10480730
Author(s) / Creator(s):
 ;  ;  ;  ;  ;  
Publisher / Repository:
Wiley Blackwell (John Wiley & Sons)
Date Published:
Journal Name:
Advanced Materials Technologies
Volume:
8
Issue:
23
ISSN:
2365-709X
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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