Mc Knight, Thomas V., Choudhury, Tanushree H., Wang, Ke, Bansal, Anushka, and Redwing, Joan M. MOCVD Growth of Tungsten Ditelluride Thin Films. Retrieved from https://par.nsf.gov/biblio/10504472. Journal of Crystal Growth 625.C Web. doi:10.1016/j.jcrysgro.2023.127436.

Mc Knight, Thomas V., Choudhury, Tanushree H., Wang, Ke, Bansal, Anushka, & Redwing, Joan M. MOCVD Growth of Tungsten Ditelluride Thin Films. Journal of Crystal Growth, 625 (C). Retrieved from https://par.nsf.gov/biblio/10504472. https://doi.org/10.1016/j.jcrysgro.2023.127436

Mc Knight, Thomas V., Choudhury, Tanushree H., Wang, Ke, Bansal, Anushka, and Redwing, Joan M. "MOCVD Growth of Tungsten Ditelluride Thin Films". Journal of Crystal Growth 625 (C). Country unknown/Code not available: Elsevier. https://doi.org/10.1016/j.jcrysgro.2023.127436. https://par.nsf.gov/biblio/10504472.

@article{osti_10504472,
place = {Country unknown/Code not available}, title = {MOCVD Growth of Tungsten Ditelluride Thin Films}, url = {https://par.nsf.gov/biblio/10504472}, DOI = {10.1016/j.jcrysgro.2023.127436}, abstractNote = {}, journal = {Journal of Crystal Growth}, volume = {625}, number = {C}, publisher = {Elsevier}, author = {Mc Knight, Thomas V. and Choudhury, Tanushree H. and Wang, Ke and Bansal, Anushka and Redwing, Joan M.}, }