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Title: Rapid Thermal Annealing Effects on Passivation Quality of p-TOPCon Silicon Solar Cells
Abstract—Unlike the traditional tube-furnace annealing at 875 °C, rapid thermal annealing (RTA) and laser annealing offer flexibility, high throughput, and control of the heating and cooling rates and holding times for effective crystallization, dopant activation, and passivation quality in the B-doped p-TOPCon device. A comprehensive scientific understanding of the effects of RTA is required. Slower RTA heating (≤ 798 K/min) and cooling (≤ 156 K/min) rates and optimal 60 s holding time at 825 °C enhanced the passivation quality, which was further improved by post anneal forming gas annealing (FGA). Faster heating and cooling rates (≥ 4800 K/min) damaged the passivation quality irreversibly and did not improve further by FGA. The optimized RTA parameters yielded iVoc of 638 mV and sheet resistance of ∼1.0 kΩ/sq. The dopant activation was independent of the heating and cooling rates.  more » « less
Award ID(s):
2005098
PAR ID:
10523318
Author(s) / Creator(s):
; ; ;
Publisher / Repository:
IEEE Society
Date Published:
Journal Name:
IEEE Journal of Photovoltaics
Volume:
14
Issue:
2
ISSN:
2156-3381
Page Range / eLocation ID:
226 to 232
Subject(s) / Keyword(s):
Silicon solar cells, Thermal annealing, Rapid thermal annealing, TOPCon
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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