Abstract Semiconductor heterojunctions are ubiquitous components of modern electronics. Their properties depend crucially on the band alignment at the interface, which may exhibit straddling gap (type-I), staggered gap (type-II) or broken gap (type-III). The distinct characteristics and applications associated with each alignment make it highly desirable to switch between them within a single material. Here we demonstrate an electrically tunable transition between type-I and type-II band alignments in MoSe2/WS2heterobilayers by investigating their luminescence and photocurrent characteristics. In their intrinsic state, these heterobilayers exhibit a type-I band alignment, resulting in the dominant intralayer exciton luminescence from MoSe2. However, the application of a strong interlayer electric field induces a transition to a type-II band alignment, leading to pronounced interlayer exciton luminescence. Furthermore, the formation of the interlayer exciton state traps free carriers at the interface, leading to the suppression of interlayer photocurrent and highly nonlinear photocurrent-voltage characteristics. This breakthrough in electrical band alignment control, interlayer exciton manipulation, and carrier trapping heralds a new era of versatile optical and (opto)electronic devices composed of van der Waals heterostructures.
more »
« less
Band alignments, conduction band edges and intralayer bandgap renormalisation in MoSe 2 /WSe 2 heterobilayers
Abstract Stacking two semiconducting transition metal dichalcogenide (MX2) monolayers to form a heterobilayer creates a new variety of semiconductor junction with unique optoelectronic features, such as hosting long-lived dipolar interlayer excitons. Despite many optical, transport, and theoretical studies, there have been few direct electronic structure measurements of these junctions. Here, we apply angle-resolved photoemission spectroscopy with micron-scale spatial resolution (µARPES) to determine the band alignments in MoSe2/WSe2heterobilayers, usingin-situelectrostatic gating to electron-dope and thus probe the conduction band edges. By comparing spectra from heterobilayers with opposite stacking orders, that is, with either MoSe2or WSe2on top, we confirm that the band alignment is type II, with the valence band maximum in the WSe2and the conduction band minimum in the MoSe2. The overall band gap isEG= 1.43 ± 0.03 eV, and to within experimental uncertainty it is unaffected by electron doping. However, the offset between the WSe2and MoSe2valence bands clearly decreases with increasing electron doping, implying band renormalisation only in the MoSe2, the layer in which the electrons accumulate. In contrast,µARPES spectra from a WS2/MoSe2heterobilayer indicate type I band alignment, with both band edges in the MoSe2. These insights into the doping-dependent band alignments and gaps of MX2heterobilayers will be useful for properly understanding and ultimately utilizing their optoelectronic properties.
more »
« less
- Award ID(s):
- 2308979
- PAR ID:
- 10549979
- Publisher / Repository:
- IOP Science
- Date Published:
- Journal Name:
- 2D Materials
- Volume:
- 11
- Issue:
- 4
- ISSN:
- 2053-1583
- Page Range / eLocation ID:
- 045021
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
More Like this
-
-
When semiconducting transition metal dichalcogenide heterostructures are stacked, the twist angle and lattice mismatch lead to a periodic moiré potential. As the angle between the layers changes, so do the electronic properties. As the angle approaches 0° or 60°, interesting characteristics and properties, such as modulations in the band edges, flat bands, and confinement, are predicted to occur. Here, we report scanning tunneling microscopy and spectroscopy measurements on the bandgaps and band modulations in MoSe 2 /WSe 2 heterostructures with near 0° rotation (R-type) and near 60° rotation (H-type). We find a modulation of the bandgap for both stacking configurations with a larger modulation for R-type than for H-type as predicted by theory. Furthermore, local density of states images show that electrons are localized differently at the valence band and conduction band edges.more » « less
-
X Ray Photoelectron Spectroscopy was used to measure valence band offsets for Al 2 O 3 deposited by Atomic Layer Deposition on α -(Al x Ga 1-x ) 2 O 3 alloys over a wide range of Al contents, x, from 0.26–0.74, corresponding to a bandgap range from 5.8–7 eV. These alloys were grown by Pulsed Laser Deposition. The band alignments were type I (nested) at x <0.5, with valence band offsets 0.13 eV for x = 0.26 and x = 0.46. At higher Al contents, the band alignment was a staggered alignment, with valence band offsets of − 0.07 eV for x = 0.58 and −0.17 for x = 0.74, ie. negative valence band offsets in both cases. The conduction band offsets are also small at these high Al contents, being only 0.07 eV at x = 0.74. The wide bandgap of the α -(Al x Ga 1-x ) 2 O 3 alloys makes it difficult to find dielectrics with nested band alignments over the entire composition range.more » « less
-
p-type Cr2MnO4 with bandgap 3.01 eV was sputter deposited onto (2¯01) and (001) n-type or semi-insulating β-Ga2O3.The heterojunction of p-type CrMnO4 on n-type Ga2O3 is found to be type II, staggered gap, i.e., the band offsets are such that both the conduction and valence band edges of Ga2O3 are lower in energy than those of the Cr2MnO4. This creates a staggered band alignment, which can facilitate the separation of photogenerated electron-hole pairs. The valence band edge of Cr2MnO4 is higher than that of Ga2O3 by 1.82–1.93 eV depending on substrate orientation and doping, which means that holes in Cr2MnO4 would have a lower energy barrier to overcome to move into Ga2O3. Conversely, the conduction band edge of Cr2MnO4 is higher than that of Ga2O3 by 0.13–0.30 eV depending on substrate doping and orientation, which would create a barrier for electrons in Ga2O3 to move into Cr2MnO4. This heterojunction looks highly promising for p-n junction formation for advanced Ga2O3-based power rectifiers.more » « less
-
Valence band offsets for SiO 2 deposited by Atomic Layer Deposition on α -(Al x Ga 1-x ) 2 O 3 alloys with x = 0.26–0.74 were measured by X-ray Photoelectron Spectroscopy. The samples were grown with a continuous composition spread to enable investigations of the band alignment as a function of the alloy composition. From measurement of the core levels in the alloys, the bandgaps were determined to range from 5.8 eV (x = 0.26) to 7 eV (x = 0.74). These are consistent with previous measurements by transmission spectroscopy. The valence band offsets of SiO 2 with these alloys of different composition were, respectively, were −1.2 eV for x = 0.26, −0.2 eV for x = 0.42, 0.2 eV for x = 0.58 and 0.4 eV for x = 0.74. All of these band offsets are too low for most device applications. Given the bandgap of the SiO 2 was 8.7 eV, this led to conduction band offsets of 4.1 eV (x = 0.26) to 1.3 eV (x = 0.74). The band alignments were of the desired nested configuration for x > 0.5, but at lower Al contents the conduction band offsets were negative, with a staggered band alignment. This shows the challenge of finding appropriate dielectrics for this ultra-wide bandgap semiconductor system.more » « less
An official website of the United States government

