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   Oxygen deficiency has been known to induce metallic conduction in bulk and thin film SrTiO3 (STO). Here, we report on the metallicity of STO substrates induced by the pulsed laser deposition (PLD) process of STO films under various oxygen-poor growth conditions. Depositions as short as 2 min result in conduction through the STO substrate. Films grown on other substrates are insulating, and STO substrates annealed under the same growth conditions without laser ablation remain insulating. By varying background gas composition during deposition, we find that the transport behavior transitions from metallic to insulating behavior at progressively higher ambient pressures for O2, 99% N2/1% O2, N2, and Ar. Metallic behavior persists to deposition pressures as high as 10−2 Torr in Ar. These results suggest that, during the PLD process, the deposition kinetics and plume energy are a dominant factor in the formation of oxygen vacancies which then diffuse into the substrate. Understanding these mechanisms is crucial to prevent STO substrate reduction during PLD of films which require low O2 partial pressures during growth. 

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4. Effect of repetition rate on ultrashort pulse laser propagation and energy deposition

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   Abstract High-entropy oxides (HEO) with entropic stabilization and compositional flexibility have great potential application in batteries and catalysis. In this work, HEO thin films were synthesized by pulsed laser deposition (PLD) from a rock-salt (Co 0.2 Ni 0.2 Cu 0.2 Mg 0.2 Zn 0.2 )O ceramic target. The films exhibited the target’s crystal structure, were chemically homogeneous, and possessed a three-dimensional (3D) island morphology with connected randomly shaped nanopores. The effects of varying PLD laser fluence on crystal structure and morphology were explored systematically. Increasing fluence facilitates film crystallization at low substrate temperature (300 °C) and increases film thickness (60–140 nm). The lateral size of columnar grains, islands (19 nm to 35 nm in average size), and nanopores (9.3 nm to 20 nm in average size) increased with increasing fluence (3.4 to 7.0 J/cm 2 ), explained by increased kinetic energy of adatoms and competition between deposition and diffusion. Additionally, increasing fluence reduces the number of undesirable droplets observed on the film surface. The nanoporous HEO films can potentially serve as electrochemical reaction interfaces with tunable surface area and excellent phase stability. Graphical abstract 

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