Kulikowski, John, Delghandi, Daniel, Wu, Chaolumen, Figueroa, Samuel D, Cunningham, William Streit, Gianola, Daniel S, Portela, Carlos M, and Gu, X Wendy. Mechanical Behavior of Nanocluster-Based Nanocomposites Made Using Two-Photon Lithography. Retrieved from https://par.nsf.gov/biblio/10630922. ACS Applied Materials & Interfaces 17.23 Web. doi:10.1021/acsami.5c07163.

Kulikowski, John, Delghandi, Daniel, Wu, Chaolumen, Figueroa, Samuel D, Cunningham, William Streit, Gianola, Daniel S, Portela, Carlos M, & Gu, X Wendy. Mechanical Behavior of Nanocluster-Based Nanocomposites Made Using Two-Photon Lithography. ACS Applied Materials & Interfaces, 17 (23). Retrieved from https://par.nsf.gov/biblio/10630922. https://doi.org/10.1021/acsami.5c07163

Kulikowski, John, Delghandi, Daniel, Wu, Chaolumen, Figueroa, Samuel D, Cunningham, William Streit, Gianola, Daniel S, Portela, Carlos M, and Gu, X Wendy. "Mechanical Behavior of Nanocluster-Based Nanocomposites Made Using Two-Photon Lithography". ACS Applied Materials & Interfaces 17 (23). Country unknown/Code not available: American Chemical Society. https://doi.org/10.1021/acsami.5c07163. https://par.nsf.gov/biblio/10630922.

@article{osti_10630922,
place = {Country unknown/Code not available}, title = {Mechanical Behavior of Nanocluster-Based Nanocomposites Made Using Two-Photon Lithography}, url = {https://par.nsf.gov/biblio/10630922}, DOI = {10.1021/acsami.5c07163}, abstractNote = {}, journal = {ACS Applied Materials & Interfaces}, volume = {17}, number = {23}, publisher = {American Chemical Society}, author = {Kulikowski, John and Delghandi, Daniel and Wu, Chaolumen and Figueroa, Samuel D and Cunningham, William Streit and Gianola, Daniel S and Portela, Carlos M and Gu, X Wendy}, }