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Abstract In this paper, transient delayed rise and fall times for beta gallium oxide ( β -Ga 2 O 3 ) nanomembrane (NM) Schottky barrier diodes (SBDs) formed on four different substrates (diamond, Si, sapphire, and polyimide) were measured using a sub-micron second resolution time-resolved electrical measurement system under different temperature conditions. The devices exhibited noticeably less-delayed turn on/turn off transient time when β -Ga 2 O 3 NM SBDs were built on a high thermal conductive (high- k ) substrate. Furthermore, a relationship between the β -Ga 2 O 3 NM thicknesses under different temperature conditions and their transient characteristics were systematically investigated and verified it using a multiphysics simulator. Overall, our results revealed the impact of various substrates with different thermal properties and different β -Ga 2 O 3 NM thicknesses on the performance of β -Ga 2 O 3 NM-based devices. Thus, the high- k substrate integration strategy will help design future β -Ga 2 O 3 -based devices by maximizing heat dissipation from the β -Ga 2 O 3 layer.

This paper reports the fabrication of β-Ga 2 O 3 nanomembrane (NM) based flexible photodetectors (PDs) and the investigation of their optoelectrical properties under bending conditions. Flexible β-Ga 2 O 3 NM PDs exhibited reliable solar-blind photo-detection under bending conditions. Interestingly, a slight shifting in wavelength of the maximum solar-blind photo-current was observed under the bending condition. To investigate the reason for this peak shifting, the optical properties of β-Ga 2 O 3 NMs under different strain conditions were measured, which revealed changes in the refractive index, extinction coefficient and bandgap of strained β-Ga 2 O 3 NMs due to the presence of nano-sized cracks in the β-Ga 2 O 3 NMs. The results of a multiphysics simulation and a density-functional theory calculation for strained β-Ga 2 O 3 NMs showed that the conduction band minimum and the valence band maximum states were shifted nearly linearly with the applied uniaxial strain, which caused changes in the optical properties of the β-Ga 2 O 3 NM. We also found that nano-gaps in the β-Ga 2 O 3 NM play a crucial role in enhancing the photoresponsivity of the β-Ga 2 O 3 NM PD under bending conditions due to the secondarymore »light absorption caused by reflected light from the nano-gap surfaces. Therefore, this research provides a viable route to realize high-performance flexible photodetectors, which are one of the indispensable components in future flexible sensor systems.« less

In this study, we demonstrate a tolerant and durable Cr/Ni bilayer metal etch mask that allows us to realize approximately 150:1 etch selectivity to diamond. This result is achieved through the use of a very thin initial Cr layer of <10 nm thickness as part of the bilayer metal mask, which results in five to ten times improved selectivity than thick single metal layer masks or bilayer masks with thicker combinations. A finite element analysis was employed to design and understand the physics and working mechanism of the bilayer metal masks with different thicknesses. Raman spectroscopy and energy-dispersive x-ray spectroscopy on the diamond surface were also performed to investigate the changes in diamond quality before and after the deep diamond etching and found that no noticeable etch damage or defects were formed. Overall, this mask strategy offers a viable way to realize deep diamond etching using a high heat and chemistry tolerant and durable bilayer metal etching mask. It also offers several technological benefits and advantages, including various deposition method options, such as sputtering and physical vapor deposition, that can be used and the total thinness of the bilayer metal mask required given the higher selectivity allows us to realize finemore »diamond etching or high-aspect ratio etching, which is a critical fabrication process for future power, RF, MEMS, and quantum device applications.

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