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Abstract We study the effect of strain on the magnetic properties and magnetization configurations in nanogranular Fe_xGe ${}_{1-x}$films ( $x=0.53\pm 0.05$) with and without B20 FeGe nanocrystals surrounded by an amorphous structure. Relaxed films on amorphous silicon nitride membranes reveal a disordered skyrmion phase while films near and on top of a rigid substrate favor ferromagnetism and an anisotropic hybridization of Fedlevels and spin-polarized Gespband states. The weakly coupled topological states emerge at room temperature and become more abundant at cryogenic temperatures without showing indications of pinning at defects or confinement to individual grains. These results demonstrate the possibility to control magnetic exchange and topological magnetism by strain and inform magnetoelasticity-mediated voltage control of topological phases in amorphous quantum materials. 

Abstract We study the influence of defects in Co/Pt multilayers on the room-temperature magnetization reversal and relaxation mechanisms via angle-dependent magnetic viscosity and coercive field measurements. The data reveal a transition from pinning-dominated domain wall propagation to a sequence of pinning-dominated and uniform switching, with increasing tilt away from the normal direction. The leading role of the dendritic domain wall propagation in the nanogranular exchange-coupled films is corroborated by the scaling of relaxation times, the angular dependence of the coercive field, and Kerr microscopy. 

We report direct imaging of boundary magnetization associated with antiferromagnetic domains in magnetoelectric epitaxial Cr 2 O 3 thin films using diamond nitrogen vacancy microscopy. We found a correlation between magnetic domain size and structural grain size which we associate with the domain formation process. We performed field cooling, i.e. , cooling from above to below the Néel temperature in the presence of a magnetic field, which resulted in the selection of one of the two otherwise degenerate 180° domains. Lifting of such a degeneracy is achievable with a magnetic field alone due to the Zeeman energy of a weak parasitic magnetic moment in Cr 2 O 3 films that originates from defects and the imbalance of the boundary magnetization of opposing interfaces. This boundary magnetization couples to the antiferromagnetic order parameter enabling selection of its orientation. Nanostructuring the Cr 2 O 3 film with mesa structures revealed reversible edge magnetic states with the direction of magnetic field during field cooling. 

Abstract Multi-functional thin films of boron (B) doped Cr 2 O 3 exhibit voltage-controlled and nonvolatile Néel vector reorientation in the absence of an applied magnetic field, H . Toggling of antiferromagnetic states is demonstrated in prototype device structures at CMOS compatible temperatures between 300 and 400 K. The boundary magnetization associated with the Néel vector orientation serves as state variable which is read via magnetoresistive detection in a Pt Hall bar adjacent to the B:Cr 2 O 3 film. Switching of the Hall voltage between zero and non-zero values implies Néel vector rotation by 90 degrees. Combined magnetometry, spin resolved inverse photoemission, electric transport and scanning probe microscopy measurements reveal B-dependent T N and resistivity enhancement, spin-canting, anisotropy reduction, dynamic polarization hysteresis and gate voltage dependent orientation of boundary magnetization. The combined effect enables H  = 0, voltage controlled, nonvolatile Néel vector rotation at high-temperature. Theoretical modeling estimates switching speeds of about 100 ps making B:Cr 2 O 3 a promising multifunctional single-phase material for energy efficient nonvolatile CMOS compatible memory applications. 

Abstract Chromia (Cr₂O₃) is a magnetoelectric oxide that permits voltage‐control of the antiferromagnetic (AFM) order, but it suffers technological constraints due to its low Néel Temperature (T_N≈307 K) and the need of a symmetry‐breaking applied magnetic field to achieve reversal of the Néel vector. Recently, boron (B) doping of Cr₂O₃films led to an increaseT_N>400 K and allowed the realization of voltage magnetic‐field free controlled Néel vector rotation. Here, the impact of B doping is directly imaged on the formation of AFM domains in Cr₂O₃thin films and elucidates the mechanism of voltage‐controlled manipulation of the spin structure using nitrogen‐vacancy (NV) scanning probe magnetometry. A stark reduction and thickness dependence of domain size in B‐doped Cr₂O₃(B:Cr₂O₃) films is found, explained by the increased germ density, likely associated with the B doping. By reconstructing the surface magnetization from the NV stray‐field maps, a qualitative distinction between the undoped and B‐doped Cr₂O₃films is found, manifested by the histogram distribution of the AFM ordering, that is, 180°domains for pure films, and 90°domains for B:Cr₂O₃films. Additionally, NV imaging of voltage‐controlled B‐doped Cr₂O₃devices corroborates the 90°rotation of the AFM domains observed in magnetotransport measurement. 

Abstract Boron (B) alloying transforms the magnetoelectric antiferromagnet Cr₂O₃into a multifunctional single‐phase material which enables electric field driven π/2 rotation of the Néel vector. Nonvolatile, voltage‐controlled Néel vector rotation is a much‐desired material property in the context of antiferromagnetic spintronics enabling ultralow power, ultrafast, nonvolatile memory, and logic device applications. Néel vector rotation is detected with the help of heavy metal (Pt) Hall‐bars in proximity of pulsed laser deposited B:Cr₂O₃films. To facilitate operation of B:Cr₂O₃‐based devices in CMOS (complementary metal‐oxide semiconductor) environments, the Néel temperature,T_N, of the functional film must be tunable to values significantly above room temperature. Cold neutron depth profiling and X‐ray photoemission spectroscopy depth profiling reveal thermally activated B‐accumulation at the B:Cr₂O₃/ vacuum interface in thin films deposited on Al₂O₃substrates. The B‐enrichment is attributed to surface segregation. Magnetotransport data confirm B‐accumulation at the interface within a layer of ≈50 nm thick where the device properties reside. HereT_Nenhances from 334 K prior to annealing, to 477 K after annealing for several hours. Scaling analysis determinesT_Nas a function of the annealing temperature. Stability of post‐annealing device properties is evident from reproducible Néel vector rotation at 370 K performed over the course of weeks.