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We investigate the surface morphologies of two series of homoepitaxial GaSb(100) thin films grown on GaSb(100) substrates by molecular beam epitaxy in a Veeco GENxplor system. The first series was grown at temperatures ranging from 290 to 490°C and serves as a control. The second series was grown using the same growth parameters with bismuth used as a surfactant during growth. We compared the two series to examine the impacts of bismuth over the range of growth temperatures on the GaSb surface morphologies using atomic force microscopy and the film properties using Raman spectroscopy and scanning electron microscopy. High-resolution x-ray diffraction was performed to confirm that bismuth was not incorporated into the films. We found that the morphological evolution of the GaSb series grown without bismuth is consistent with the standard surface nucleation theory and identified the 2D-3D transition temperature as close to 290° C. In contrast, the presence of a Bi surfactant during growth was found to significantly alter the surface morphology and prevent undesired 3D islands at low temperatures. We also observed a preference for hillocks over step morphology at high growth temperatures, antistep bunching effects at intermediate temperatures, and the evolution from step-meandering to mound morphologies at low temperatures. This morphological divergence from the first series indicates that bismuth significantly increases in the 2D Erlich–Schwöebel potential barrier of the atomic terraces, inducing an uphill adatom flux that can smoothen the surface. Our findings demonstrate that bismuth surfactant can improve the surface morphology and film structure of low-temperature grown GaSb. Bismuth surfactant may also improve other homoepitaxial III-V systems grown in nonideal conditions. 

Due to its refractory properties and higher oxidation resistance, iridium (Ir) exhibits great potential for applications such as thermophotovoltaic emitters or contamination sensing. However, the lack of its temperature-dependent optical data prevents accurate modeling of Ir-based optical devices operating at higher temperatures. In this work, refractive indices of as-deposited and annealed Ir films, sputter-deposited, are characterized at between room temperature and 550°C over 300 nm to 15 µm of wavelength. The extinction coefficients of both as-deposited and annealed Ir films tend to decrease as temperature increases, with the exception of as-deposited Ir at 550°C due to significant grain growth. Under 530°C, optical constants of as-deposited Ir are less sensitive to temperature than those of annealed Ir. These characteristics of Ir films are correlated with their microstructural changes. 

Two- or three-dimensionally patterned subwavelength structures, also known as metamaterials, have the advantage of arbitrarily engineerable optical properties. In thermophotovoltaic (TPV) applications, metamaterials are commonly used to optimize the emitter’s radiation spectrum for various source temperatures. The output power of a TPV device is proportional to the photon flux, which is proportional to the emitter size. However, using 2D or 3D metamaterials imposes challenges to realizing large emitters since fabricating their subwavelength features typically involves complicated fabrication processes and is highly time-consuming. In this work, we demonstrate a large-area (78 cm2) thermal emitter. This emitter is simply fabricated with one-dimensional layers of silicon (Si) and chromium (Cr), and therefore, it can be easily scaled up to even larger sizes. The emissivity spectrum of the emitter is measured at 802 K, targeting an emission peak in the mid-infrared. The emissivity peak is ∼0.84 at the wavelength of 3.75 μm with a 1.2 μm bandwidth. Moreover, the emission spectrum of our emitter can be tailored for various source temperatures by changing the Si thickness. Therefore, the results of this work can lead to enabling TPV applications with higher output power and lower fabrication cost. 

The refractory metal iridium has many applications in high performance optical devices due to its high reflectivity into X-ray frequencies, low oxidation rate, and high melting point. Depositing Ir via magnetron sputtering produces high quality thin films, but the chamber pressure and sputter conditions can change Ir film microstructure on the nanoscale. Film microstructure is commonly examined through microscopy of film cross-sections, which is both a destructive characterization method and time consuming. In this work, we have utilized a non-destructive characterization technique, spectroscopic ellipsometry, to correlate the optical properties of the metal films with their structural morphologies, enabling large-scale inspection of optical components or the ability to customize the metal refractive index for the application at hand. The optical properties of Ir thin films deposited at chamber pressures from 10 mTorr to 25 mTorr are reported and compared to microscopy and resistivity results. The measurements were conducted with films deposited both on a bare wafer and on a titanium sublayer.