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Achieving control of phase memory relaxation times ( T m ) in metal ions is an important goal of molecular spintronics. Herein we provide the first evidence that nuclear-spin patterning in the ligand shell is an important handle to modulate T m in metal ions. We synthesized and studied a series of five V( iv ) complexes with brominated catecholate ligands, [V(C 6 H 4−n Br n O 2 ) 3 ] 2− ( n = 0, 1, 2, and 4), where the 79/81 Br and 1 H nuclear spins are arranged in different substitutional patterns. High-field, high-frequency (120 GHz) pulsed electron paramagnetic resonance spectroscopic analysis of this series reveals a pattern-dependent variation in T m for the V( iv ) ion. Notably, we show that it is possible for two molecules to have starkly different (by 50%) T m values despite the same chemical composition. Nuclear magnetic resonance analyses of the protons on the ligand shell suggest that relative chemical shift ( δ ), controlled by the patterning of nuclear spins, is an important underlying design principle. Here, having multiple ligand-based protons with nearly identical chemical shift values in the ligand shell will, ultimately, engender a short T m for the bound metal ion. 

Dynamic Nuclear Polarization (DNP) can increase the sensitivity of Nuclear Magnetic Resonance (NMR), but it is challenging in the liquid state at high magnetic fields. In this study we demonstrate significant enhancements of NMR signals (up to 70 on 13C) in the liquid state by scalar Overhauser DNP at 14.1 T, with high resolution (~0.1 ppm) and relatively large sample volume (~100 µL). 

We describe a 395 GHz pulsed electron paramagnetic resonance (EPR) setup, and initial results of relaxation measure-ments and cw EPR at these frequencies in samples used for liquid- and solid-state nuclear magnetic resonance enhanced by dynamic nuclear polarization (DNP). Depending on the amount of spin –orbit coupling, the spin lattice relaxation becomes significantly faster at higher fields and frequencies, which has consequences for some DNP applications at high fields and frequencies. We will dis-cuss the requirements for (sub)millimeter-wave sources and com-ponents for DNP and pulsed EPR at even higher frequencies and fields, as even higher magnetic fields will become available in the near future.