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Establishing ohmic contact to van der Waals semiconductors such as MoS2 is crucial to unlocking their full potential in next-generation electronic devices. Encapsulation of few layer MoS2 with hBN preserves the material’s electronic properties but makes electrical contacts more challenging. Progress toward high quality edge contact to encapsulated MoS2 has been recently reported. Here, we evaluate a contact methodology using sputtered MoRe, a type II superconductor with a relatively high critical field and temperature commonly used to induce superconductivity in graphene. We find that the contact transparency is poor and that the devices do not support a measurable supercurrent down to 3 K, which has ramifications for future fabrication recipes. 

This abstract presents a study on the avalanche capability of GaN p-i-n diode leading to the achievement of 60A/W, 278V GaN avalanche photodiode. The GaN p-i-n diode fabricated on a free-standing GaN substrate was avalanche capable due to optimal edge termination. Both electrical and optical characterizations were conducted to validate the occurrence of avalanche in these devices. The device showed a positive temperature coefficient of breakdown voltage, which follows the nature of avalanche breakdown. The positive coefficient was measured to be 3.85 ×10^(-4) K^(-1) (0.1V/K) under a measurement temperature ranges from 300 K to 525 K. Moreover, the fabricated device showed excellent performance as an avalanche photo detector with record device metrics: (1) record high photoresponsivity of 60 A/W; (2) high optical gain of 10^5 ; and (3) low cark current. Robust avalanche is a key requirement in various device applications and necessary for their reliable operation.