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Award ID contains: 1853254

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  1. (, Digest of technical papers)
    We present source design and process results of a linearly scalable ribbon ion beam for modifying materials by an ion implantation technique. Our source technology enables beam currents up to 30 mA/cm2 and ion implant energies up to 60keV enabling economically viable large format and high throughput processing. In this paper, we demonstrate application of this ion source towards the production of glass and sapphire substrates with durable broadband anti-reflection surfaces with reflectance <0.5% in the visible spectra. In addition, the anti-reflection surface is shown to remain after subsequent tempering and chemical strengthening processes. 
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  2. ; ; ; ; ; ; ; (, Surface and Coatings Technology)
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