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Title: 62-1: Large-Area Ion Implantation Source for Production of Anti-Reflection Surfaces in Glass and Sapphire Substrates
We present source design and process results of a linearly scalable ribbon ion beam for modifying materials by an ion implantation technique. Our source technology enables beam currents up to 30 mA/cm2 and ion implant energies up to 60keV enabling economically viable large format and high throughput processing. In this paper, we demonstrate application of this ion source towards the production of glass and sapphire substrates with durable broadband anti-reflection surfaces with reflectance <0.5% in the visible spectra. In addition, the anti-reflection surface is shown to remain after subsequent tempering and chemical strengthening processes.  more » « less
Award ID(s):
1853254
PAR ID:
10487715
Author(s) / Creator(s):
Publisher / Repository:
Society for Information Display International Symposium
Date Published:
Journal Name:
Digest of technical papers
Volume:
53
Issue:
1
ISSN:
2168-0159
Page Range / eLocation ID:
808-811
Subject(s) / Keyword(s):
ion implantation anti-reflection surface modification display glass large format substrates automotive
Format(s):
Medium: X
Location:
https://sid.onlinelibrary.wiley.com/doi/10.1002/sdtp.15615
Sponsoring Org:
National Science Foundation
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