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Power semiconductor devices are fundamental drivers for advances in power electronics, the technology for electric energy conversion. Power devices based on wide-bandgap (WBG) and ultra-wide bandgap (UWBG) semiconductors allow for a smaller chip size, lower loss and higher frequency compared with their silicon (Si) counterparts, thus enabling a higher system efficiency and smaller form factor. Amongst the challenges for the development and deployment of WBG and UWBG devices is the efficient dissipation of heat, an unavoidable by-product of the higher power density. To mitigate the performance limitations and reliability issues caused by self-heating, thermal management is required at both device and package levels. Packaging in particular is a crucial milestone for the development of any power device technology; WBG and UWBG devices have both reached this milestone recently. This paper provides a timely review of the thermal management of WBG and UWBG power devices with an emphasis on packaged devices. Additionally, emerging UWBG devices hold good promise for high-temperature applications due to their low intrinsic carrier density and increased dopant ionization at elevated temperatures. The fulfillment of this promise in system applications, in conjunction with overcoming the thermal limitations of some UWBG materials, requires new thermal management and packaging technologies. To this end, we provide perspectives on the relevant challenges, potential solutions and research opportunities, highlighting the pressing needs for device–package electrothermal co-design and high-temperature packages that can withstand the high electric fields expected in UWBG devices.

 

Edge termination is the enabling building block of power devices to exploit the high breakdown field of wide bandgap (WBG) and ultra-wide bandgap (UWBG) semiconductors. This work presents a heterogeneous junction termination extension (JTE) based on p-type nickel oxide (NiO) for gallium oxide (Ga2O3) devices. Distinct from prior JTEs usually made by implantation or etch, this NiO JTE is deposited on the surface of Ga2O3 by magnetron sputtering. The JTE consists of multiple NiO layers with various lengths to allow for a graded decrease in effective charge density away from the device active region. Moreover, this surface JTE has broad design window and process latitude, and its efficiency is drift-layer agnostic. The physics of this NiO JTE is validated by experimental applications into NiO/Ga2O3 p–n diodes fabricated on two Ga2O3 wafers with different doping concentrations. The JTE enables a breakdown voltage over 3.2 kV and a consistent parallel-plate junction field of 4.2 MV/cm in both devices, rendering a power figure of merit of 2.5–2.7 GW/cm2. These results show the great promise of the deposited JTE as a flexible, near ideal edge termination for WBG and UWBG devices, particularly those lacking high-quality homojunctions. 

Abstract Benefitted from progress on the large-diameter Ga 2 O 3 wafers and Ga 2 O 3 processing techniques, the Ga 2 O 3 power device technology has witnessed fast advances toward power electronics applications. Recently, reports on large-area (ampere-class) Ga 2 O 3 power devices have emerged globally, and the scope of these works have gone well beyond the bare-die device demonstration into the device packaging, circuit testing, and ruggedness evaluation. These results have placed Ga 2 O 3 in a unique position as the only ultra-wide bandgap semiconductor reaching these indispensable milestones for power device development. This paper presents a timely review on the state-of-the-art of the ampere-class Ga 2 O 3 power devices (current up to >100 A and voltage up to >2000 V), including their static electrical performance, switching characteristics, packaging and thermal management, and the overcurrent/overvoltage ruggedness and reliability. Exciting research opportunities and critical technological gaps are also discussed. 

Abstract Breakdown voltage (BV) is arguably one of the most critical parameters for power devices. While avalanche breakdown is prevailing in silicon and silicon carbide devices, it is lacking in many wide bandgap (WBG) and ultra-wide bandgap (UWBG) devices, such as the gallium nitride high electron mobility transistor and existing UWBG devices, due to the deployment of junction-less device structures or the inherent material challenges of forming p-n junctions. This paper starts with a survey of avalanche and non-avalanche breakdown mechanisms in WBG and UWBG devices, followed by the distinction between the static and dynamic BV. Various BV characterization methods, including the static and pulse I – V sweep, unclamped and clamped inductive switching, as well as continuous overvoltage switching, are comparatively introduced. The device physics behind the time- and frequency-dependent BV as well as the enabling device structures for avalanche breakdown are also discussed. The paper concludes by identifying research gaps for understanding the breakdown of WBG and UWBG power devices.