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Title: Modifications of ion beam sputtered tantala thin films by secondary argon and oxygen bombardment

Amorphous tantala (Ta2O5) thin films were deposited by reactive ion beam sputtering with simultaneous low energy assistAr+orAr+/O2+bombardment. Under the conditions of the experiment, the as-deposited thin films are amorphous and stoichiometric. The refractive index and optical band gap of thin films remain unchanged by ion bombardment. Around 20% improvement in room temperature mechanical loss and 60% decrease in absorption loss are found in samples bombarded with 100-eVAr+. A detrimental influence from low energyO2+bombardment on absorption loss and mechanical loss is observed. Low energyAr+bombardment removes excess oxygen point defects, whileO2+bombardment introduces defects into the tantala films.

Authors:
; ; ; ; ; ; ; ;
Award ID(s):
1710957 1708175 1707866
Publication Date:
NSF-PAR ID:
10130458
Journal Name:
Applied Optics
Volume:
59
Issue:
5
Page Range or eLocation-ID:
Article No. A150
ISSN:
1559-128X; APOPAI
Publisher:
Optical Society of America
Sponsoring Org:
National Science Foundation
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