In Situ Crystalline AlN Passivation for Reduced RF Dispersion in Strained‐Channel AlN/GaN/AlN High‐Electron‐Mobility Transistors
- Publication Date:
- NSF-PAR ID:
- 10306293
- Journal Name:
- physica status solidi (a)
- Volume:
- 219
- Issue:
- 4
- Page Range or eLocation-ID:
- Article No. 2100452
- ISSN:
- 1862-6300
- Publisher:
- Wiley Blackwell (John Wiley & Sons)
- Sponsoring Org:
- National Science Foundation