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1. Top-quark production at approximate N3LO

   https://doi.org/10.22323/1.398.0465  

   Kidonakis, Nikolaos (April 2022, The European Physical Society Conference on High Energy Physics (EPS-HEP2021))

   I discuss recent theoretical results with soft-gluon corrections for various top-quark production processes through approximate N3LO, including soft anomalous dimensions through three loops. I present numerical results for total cross sections and differential distributions for top-pair and tW production as well as for three-particle final states with a top quark and a Higgs boson. I show that soft-gluon corrections are dominant for a large range of collider energies. 

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2. Soft Anomalous Dimensions and Resummation in QCD

   https://doi.org/10.3390/universe6100165  

   Kidonakis, Nikolaos (October 2020, Universe)

   null (Ed.)

   I discuss and review soft anomalous dimensions in QCD that describe soft-gluon threshold resummation for a wide range of hard-scattering processes. The factorization properties of the cross section in moment space and renormalization-group evolution are implemented to derive a general form for differential resummed cross sections. Detailed expressions are given for the soft anomalous dimensions at one, two, and three loops, including some new results, for a large number of partonic processes involving top quarks, electroweak bosons, Higgs bosons, and other particles in the standard model and beyond. 

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3. Total and Differential Cross Sections for Higgs and Top-Quark Production

   https://doi.org/10.3390/universe4110121  

   Kidonakis, Nikolaos (November 2018, Universe)

   I present theoretical calculations for Higgs-boson and top-quark production, including high-order soft-gluon corrections. I discuss charged-Higgs production in association with a top quark or a W boson, as well as single-top and top-antitop production. Total cross sections as well as transverse-momentum and rapidity distributions of the top quark or the Higgs boson are presented for various LHC energies. 

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4. Three-loop effective potential for softly broken supersymmetry

   https://doi.org/10.1103/PhysRevD.109.015019  

   Martin, Stephen P (January 2024, Physical Review D)

   The effective potential has been previously calculated through three-loop order, in Landau gauge, for a general renormalizable theory using dimensional regularization. However, dimensional regularization is not appropriate for softly broken supersymmetric gauge theories, because it explicitly violates supersymmetry. In this paper, I obtain the three-loop effective potential using a supersymmetric regulator based on dimensional reduction. Checks follow from the vanishing of the effective potential in examples with supersymmetric vacua, and from renormalization scale invariance in examples for which supersymmetry is broken, either spontaneously or explicitly by soft terms. As byproducts, I obtain the three-loop Landau gauge anomalous dimension for the scalar component of a chiral supermultiplet, and the beta function for the field-independent vacuum energy. 

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5. Application and patterning of atomic and small-molecule resists for area-selective deposition on silicon

   Raffaelle, Patrick R (September 2024, University of Rochester)

   The fabrication of 2D devices with micro/nano-scale features often rely on assembly from a top-down perspective, where the design emphasis is on the removal of material to generate surface features. Common “top-down” approaches to fabrication often include “pattern and subtract” techniques which require energy-intensive processing and result in a high volume of material waste of substances such as photoresists, etchant, and developers. In addition to high energy and material dissipation, traditional “top-down” approaches have also struggled to adapt to the continuous downsizing of critical dimensions of 3D device components. Thus, instead of generating devices from a “top-down” perspective, there has been a push over the last two decades to instead leverage the intrinsic differences in chemical behavior between surface species, such that feature deposition selectively begins at the surface and grows vertically in an additive fashion via reaction from the “bottom-up”. Here, I will evaluate the ability of different small molecule and atomic layers to enable selective deposition on a silicon substrate. Specifically, I will be investigating a carbenylated organic molecule, a perfluorinated amine, and atomic halogen species on their ability to inhibit deposition atomic layer deposition (ALD) of a metal oxide. When paired with a hydrolyzed surface (which promotes metal oxide growth), these inhibiting species may be used to form complementary resist systems which can enable area-selective ALD (AS-ALD) on a surface. Another primary consideration in “bottom-up” approaches to feature fabrication is the ability to pattern these small molecule and atomic surface layers such that they form a template for selective growth. To this end, I will explore using ultrafast laser patterning and contact transfer printing to selectively deposit or alter these surface layers to generate complementary surface domains that can serve as a foundation for a AS-ALD platform. 

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